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Negative Resistance Region 10 nm Gate Length on FINFET
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作者 Maryam Nezafat Omid Zeynali daruosh masti 《Journal of Modern Physics》 2014年第12期1117-1123,共7页
In this paper the physical characteristics of FINFET (fin-field effect transistor) transistor behavior are investigated. For the analysis, semi-classical electron transfer method was used based on drift diffusion appr... In this paper the physical characteristics of FINFET (fin-field effect transistor) transistor behavior are investigated. For the analysis, semi-classical electron transfer method was used based on drift diffusion approximation by TCAD (Tiber CAD) software. Simulations show that the output resistance of FINFET along very small gate (gate length and fin height of 50 nm) is negative. The negative resistance is used in oscillators. 展开更多
关键词 Multi-Gate MOSFET (Metal-Oxide-Semiconductor FIELD-EFFECT Transistor) FINFET Silicon on INSULATOR NEGATIVE Resistance
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