We report on a simple and efficient method for the selective positioning of Au/DNA hybrid nanocircuits using a sequential combination of electron-beam lithography(EBL),plasma ashing,and a molecular patterning process....We report on a simple and efficient method for the selective positioning of Au/DNA hybrid nanocircuits using a sequential combination of electron-beam lithography(EBL),plasma ashing,and a molecular patterning process.The nanostructures produced by the EBL and ashing process could be uniformly formed over a 12.6 in 2 substrate with sub-10 nm patterning with good pattern fidelity.In addition,DNA molecules were immobilized on the selectively nanopatterned regions by alternating surface coating procedures of 3-(aminopropyl)triethoxysilane(APS)and diamond like carbon(DLC),followed by deposition of DNA molecules into a well-defined single DNA nanowire.These single DNA nanowires were used not only for fabricating Au/DNA hybrid nanowires by the conjugation of Au nanoparticles with DNA,but also for the formation of Au/DNA hybrid nanocircuits.These nanocircuits prepared from Au/DNA hybrid nanowires demonstrate conductivities of up to 4.3×10^(5) S/m in stable electrical performance.This selective and precise positioning method capable of controlling the size of nanostructures may find application in making sub-10 nm DNA wires and metal/DNA hybrid nanocircuits.展开更多
基金This work was supported by the Ministry of Health&Welfare,Republic of Korea(HI19C0642)by the Ministry of Trade,Industry and Energy(MOTIE)and Korea Institute for Advancement of Technology(KIAT)through the International Cooperative R&D program(Project No.P0004638)by the Gumi Core Components and Materials Technology Development Program of the Gumi Regional Government(Core Project-563 grant,2019).
文摘We report on a simple and efficient method for the selective positioning of Au/DNA hybrid nanocircuits using a sequential combination of electron-beam lithography(EBL),plasma ashing,and a molecular patterning process.The nanostructures produced by the EBL and ashing process could be uniformly formed over a 12.6 in 2 substrate with sub-10 nm patterning with good pattern fidelity.In addition,DNA molecules were immobilized on the selectively nanopatterned regions by alternating surface coating procedures of 3-(aminopropyl)triethoxysilane(APS)and diamond like carbon(DLC),followed by deposition of DNA molecules into a well-defined single DNA nanowire.These single DNA nanowires were used not only for fabricating Au/DNA hybrid nanowires by the conjugation of Au nanoparticles with DNA,but also for the formation of Au/DNA hybrid nanocircuits.These nanocircuits prepared from Au/DNA hybrid nanowires demonstrate conductivities of up to 4.3×10^(5) S/m in stable electrical performance.This selective and precise positioning method capable of controlling the size of nanostructures may find application in making sub-10 nm DNA wires and metal/DNA hybrid nanocircuits.
