期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
A Review of PVT Compensation Circuits for Advanced CMOS Technologies 被引量:1
1
作者 Andrey Malkov dmitry vasiounin Oleg Semenov 《Circuits and Systems》 2011年第3期162-169,共8页
The recent high-performance interfaces like DDR2, DDR3, USB and Serial ATA require their output drivers to provide a minimum variation of rise and fall times over Process, Voltage, and Temperature (PVT) and output loa... The recent high-performance interfaces like DDR2, DDR3, USB and Serial ATA require their output drivers to provide a minimum variation of rise and fall times over Process, Voltage, and Temperature (PVT) and output load variations. As the interface speed grows up, the output drivers have been important component for high quality signal integrity, because the output voltage levels and slew rate are mainly determined by the output drivers. The output driver impedance compliance with the transmission line is a key factor in noise minimization due to the signal reflections. In this paper, the different implementations of PVT compensation circuits are analyzed for cmos45nm and cmos65nm technology processes. One of the considered PVT compensation circuits uses the analog compensation approach. This circuit was designed in cmos45nm technology. Other two PVT compensation circuits use the digital compensation method. These circuits were designed in cmos65nm technology. Their electrical characteristics are matched with the requirements for I/O drivers with respect to DDR2 and DDR3 standards. DDR2 I/O design was done by the Freescale wireless design team for mobile phones and later was re-used for other high speed interface designs. In conclusion, the advantages and disadvantages of considered PVT control circuits are analyzed. 展开更多
关键词 PVT COMPENSATION PVT Control Circuit Process VARIATION DDR Interface I/O DRIVER
下载PDF
Challenges in Quality Certification of I/O Libraries
2
作者 Oleg Semenov dmitry vasiounin Victor Spitsyn 《Circuits and Systems》 2012年第4期300-306,共7页
Cooperation between manufacturing and other functional groups is critical to improve the success of new products. However, integrating operations and development methodologies is often challenging due to conflicting p... Cooperation between manufacturing and other functional groups is critical to improve the success of new products. However, integrating operations and development methodologies is often challenging due to conflicting priorities and organizational structures. Improving the quality of product development and the transition to manufacturing is not a new venture. Organizations have been incorporating planning and continuous improvement to their product develop-ment initiatives for decades. This paper summarizes the experience of I/O libraries quality certification within Freescale Semiconductor and describes the certification flow developed by Corporate Quality and I/O Design teams. 展开更多
关键词 I/O Library ELECTROSTATIC Discharge QUALITY CERTIFICATION LATCH-UP I/O Driver
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部