For high-power impulse magnetron sputtering(HIPIMS),the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio.In this work,chromium(Cr...For high-power impulse magnetron sputtering(HIPIMS),the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio.In this work,chromium(Cr)films were deposited on 316-L stainless steel substrates and silicon(100) wafers with different peak powers by HIPIMS.The relationship between peak target power and properties of Cr films was explored in detail.The resulting structure and mechanical properties of deposited Cr films were characterized by X-ray diffraction(XRD),transmission electron microscope(TEM),atomic force microscopy(AFM),indentation hardness and scratch tester.The results indicate that the ionization degree of metal target and ion/atom flux ratio increase with the increase in peak power but without the loss of deposition rate at the same time.At low ionization degree,the deposited Cr film has low compressive residual stress and low hardness but good adhesion strength.When the ionization degree of target metal increases with increasing peak power,Cr film exhibits finer size and smoother surface with improved hardness but decreased adhesion strength.展开更多
基金financially supported by Joint Fund of National Natural Science Foundation of China and China Academy of Engineering Physics (No.U1330113)the National Natural Science Foundation of China (No.31300787)the Overseas Famous Teacher Program of Chinese Education Ministry (No. MS2010XNJT070)。
文摘For high-power impulse magnetron sputtering(HIPIMS),the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio.In this work,chromium(Cr)films were deposited on 316-L stainless steel substrates and silicon(100) wafers with different peak powers by HIPIMS.The relationship between peak target power and properties of Cr films was explored in detail.The resulting structure and mechanical properties of deposited Cr films were characterized by X-ray diffraction(XRD),transmission electron microscope(TEM),atomic force microscopy(AFM),indentation hardness and scratch tester.The results indicate that the ionization degree of metal target and ion/atom flux ratio increase with the increase in peak power but without the loss of deposition rate at the same time.At low ionization degree,the deposited Cr film has low compressive residual stress and low hardness but good adhesion strength.When the ionization degree of target metal increases with increasing peak power,Cr film exhibits finer size and smoother surface with improved hardness but decreased adhesion strength.
