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Efficacy of a new mutated recombinant tissue-type plasminogen activator in beagles with acute coronary artery thrombi
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作者 Jing Bai Lin-bo Ye +2 位作者 Hong Jiang dong-dong zhao Hong-yao Hu 《World Journal of Emergency Medicine》 SCIE CAS 2010年第2期126-131,共6页
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Total ionizing dose effect of gamma rays on H-gate PDSOI MOS devices at different dose rates 被引量:3
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作者 Qian-Qiong Wang Hong-Xia Liu +4 位作者 Shu-Long Wang Chen-Xi Fei dong-dong zhao Shu-Peng Chen Wei Chen 《Nuclear Science and Techniques》 SCIE CAS CSCD 2017年第10期51-57,共7页
The total dose effect of ^(60)Co γ-rays on 0.8μm H-gate partially depleted-silicon-on-insulator NMOS devices was investigated at different irradiation doses. The results show that the shift in saturation current at ... The total dose effect of ^(60)Co γ-rays on 0.8μm H-gate partially depleted-silicon-on-insulator NMOS devices was investigated at different irradiation doses. The results show that the shift in saturation current at high dose rate is greater than that at low dose rate, due to increase in interface-state density with decreasing dose rate; the scattering effect of interface state on electrons in the channel causes degradation in carrier mobility; and the body current and transconductance of the back gate enhance low-doserate sensitivity when the irradiation is under OFF-bias. A double transconductance peak is observed at 3 kGy(Si)under high dose rates. 展开更多
关键词 NMOS器件 低剂量率 总剂量效应 H型 线对 SOI 界面态密度 绝缘体上硅
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Effects of total dose irradiation on the threshold voltage of H-gate SOI NMOS devices 被引量:3
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作者 Qian-Qiong Wang Hong-Xia Liu +3 位作者 Shu-Peng Chen Shu-Long Wang Chen-Xi Fei dong-dong zhao 《Nuclear Science and Techniques》 SCIE CAS CSCD 2016年第5期193-199,共7页
This work researched the impact of total dose irradiation on the threshold voltage of N-type metal oxide semiconductor field effect transistors(nMOSFETs) in silicon-on-insulator(SOI) technology.Using the subthreshold ... This work researched the impact of total dose irradiation on the threshold voltage of N-type metal oxide semiconductor field effect transistors(nMOSFETs) in silicon-on-insulator(SOI) technology.Using the subthreshold separation technology,the factor causing the threshold voltage shift was divided into two parts:trapped oxide charges and interface states,the effects of which are presented under irradiation.Furthermore,by analyzing the data,the threshold voltage shows a negative shift at first and then turns to positive shift when irradiation dose is lower.Additionally,the influence of the dose rate effects on threshold voltage is discussed.The research results show that the threshold voltage shift is more significant in low dose rate conditions,even for a low dose of100 krad(Si).The degeneration value of threshold voltage is 23.4%and 58.0%for the front-gate and the back-gate at the low dose rate,respectively. 展开更多
关键词 阈值电压漂移 总剂量辐照 NMOS器件 SOI 金属氧化物半导体场效应晶体管 H型 低剂量率 分离技术
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Al-Mg合金孪晶变形的第一性原理研究(英文) 被引量:1
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作者 赵冬冬 Ole Martin L?VVIK +1 位作者 Knut MARTHINSEN 李彦军 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2017年第6期1313-1318,共6页
镁元素可以降低铝的本征层错能,因而Al-Mg合金被认为具备孪晶变形的潜力。然而在多种大变形Al-Mg合金中很难发现变形孪晶。为了探究Al-Mg合金的孪晶变形潜能,采用第一性原理计算研究镁和空位对铝广义层错能的影响。研究发现Mg和空位均... 镁元素可以降低铝的本征层错能,因而Al-Mg合金被认为具备孪晶变形的潜力。然而在多种大变形Al-Mg合金中很难发现变形孪晶。为了探究Al-Mg合金的孪晶变形潜能,采用第一性原理计算研究镁和空位对铝广义层错能的影响。研究发现Mg和空位均具有层错Suzuki偏析特性,并且会降低Al的本征层错能。但是随着镁含量的提高,铝的本征层错能不会持续降低,孪晶特性参数τa也不会持续升高。基于Al-Mg合金的孪晶特性参数τa,我们预测即使在高固溶镁含量下,Al-Mg合金依然很难发生孪晶变形。镁和空位所引起的本征层错能的降低在一定程度上能够提高大变形Al-Mg合金的加工硬化速率并且促进变形带的形成。 展开更多
关键词 广义层错能 本征层错能 Suzuki偏析 空位 AL-MG合金
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