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HIGH EPITAXIAL FERROELECTRIC RELAXOR Mn-DOPED Ba(Zr,Ti)O_(3) THIN FILMS ON MgO SUBSTRATES
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作者 M.LIU J.LIU +11 位作者 G.COLLINS C.R.MA C.L.CHEN A.D.ALEMAYEHU G.SUBRAMANYAM C.DAI Y.LIN J.HE J.C.JIANG e.i.meletis A.BHALLA Q.Y.ZHANG 《Journal of Advanced Dielectrics》 CAS 2011年第4期383-387,共5页
Environment friendly ferroelectric relaxor Ba(Zr_(0.2)Ti_(0.8))O_(3)thin fims with the addition of 2%Mn dopant were grown on(001)MgO substrates by pulsed laser deposition.Microstructure studies with X-ray di®ract... Environment friendly ferroelectric relaxor Ba(Zr_(0.2)Ti_(0.8))O_(3)thin fims with the addition of 2%Mn dopant were grown on(001)MgO substrates by pulsed laser deposition.Microstructure studies with X-ray di®raction and transmission electron microscopy reveal that the as-grown Ba(Zr_(0.2)Ti_(0.8))O_(3) thin films are c-axis oriented with an atomic sharp interface.The films have good single crystallinity and good epitaxial quality.The interface relationship was determined to be[100]Mn.BZT//[100]MgO and(001)Mn.BZT//(001)MgO.Nanoscale order/disorder relaxor structures were found with nano-columnar structures.The microwave dielectric measurements(15-18GHz)indicate that the¯lms have excellent dielectric properties with large dielectric constant value,high tunability,and low dielectric loss,promising the development of room temperature tunable microwave elements. 展开更多
关键词 Ferroelectric relaxor thin films Ba(Zr_(0.2)Ti_(0.8))O_(3) dielectric microwave
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