Intermediate stage of the three and four-pronged events is investigated in the reaction ^208Pb＋^197Au at beam energy 11.67 MeV/u. Multiprong events are analysed numerically using an empirical mass-dependent velocityr...Intermediate stage of the three and four-pronged events is investigated in the reaction ^208Pb＋^197Au at beam energy 11.67 MeV/u. Multiprong events are analysed numerically using an empirical mass-dependent velocityrauge relation. Using the measured three-dimensional coordinates of correlated tracks, it is possible to determine the quantities such as mass transfer and total kinetic energy loss. These quantities are then used to study the intermediate stage of the reaction. It has been observed that mass transfer and total kinetic energy loss at the first step of the reaction decides the multiplicity of an event at the second stage of the sequential fission process.展开更多
We present a systematic study to create ultra-shallow junctions in n-type silicon substrates and investigate both pre-and post-annealing processes to create a processing strategy for potential applications in nano-dev...We present a systematic study to create ultra-shallow junctions in n-type silicon substrates and investigate both pre-and post-annealing processes to create a processing strategy for potential applications in nano-devices.Starting wafers were co-implanted with indium and C atoms at energies of 70 keV and 10 keV,respectively.A carefully chosen implantation schedule provides an abrupt ultra-shallow junction between 17 and 43 nm with suppressed sheet resistance and appropriate retained sheet carrier concentration at low thermal budget.A defect doping matrix,primarily the behavior and movement of co-implant generated interstitials at different annealing temperatures,may be engineered to form sufficiently activated ultra-shallow devices.展开更多
文摘Intermediate stage of the three and four-pronged events is investigated in the reaction ^208Pb＋^197Au at beam energy 11.67 MeV/u. Multiprong events are analysed numerically using an empirical mass-dependent velocityrauge relation. Using the measured three-dimensional coordinates of correlated tracks, it is possible to determine the quantities such as mass transfer and total kinetic energy loss. These quantities are then used to study the intermediate stage of the reaction. It has been observed that mass transfer and total kinetic energy loss at the first step of the reaction decides the multiplicity of an event at the second stage of the sequential fission process.
文摘We present a systematic study to create ultra-shallow junctions in n-type silicon substrates and investigate both pre-and post-annealing processes to create a processing strategy for potential applications in nano-devices.Starting wafers were co-implanted with indium and C atoms at energies of 70 keV and 10 keV,respectively.A carefully chosen implantation schedule provides an abrupt ultra-shallow junction between 17 and 43 nm with suppressed sheet resistance and appropriate retained sheet carrier concentration at low thermal budget.A defect doping matrix,primarily the behavior and movement of co-implant generated interstitials at different annealing temperatures,may be engineered to form sufficiently activated ultra-shallow devices.
