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The impact of germanium in strained Si/relaxed Si_(1-x)Ge_x on carrier performance in non-degenerate and degenerate regimes 被引量:1
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作者 engsiew kang S Anwar +1 位作者 M T Ahmadi Razali Ismail 《Journal of Semiconductors》 EI CAS CSCD 2013年第6期1-4,共4页
The impact of the fraction of germanium on the carrier performance of two-dimensional strained silicon, which embraces both the non-degenerate and degenerate regimes,is developed.In this model,the Fermi integral of or... The impact of the fraction of germanium on the carrier performance of two-dimensional strained silicon, which embraces both the non-degenerate and degenerate regimes,is developed.In this model,the Fermi integral of order zero is employed.The impact of the fraction of germanium on the relaxed Si_(1-x)Ge_x substrate(x),carrier concentration and temperature is reported.It is revealed that the effect of x on the hole concentration is dominant for a normalized Fermi energy of more than three,or in other words the non-degenerate regime.On the contrary, the x gradient has less influence in the degenerate regime.Furthermore,by increasing x there is an increase in the intrinsic velocity,particularly with high carrier concentration and temperature. 展开更多
关键词 GERMANIUM intrinsic velocity SIGE hole concentration two dimensional
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