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Preparation and Critical Current Measurements of Laser Ablated YBCO Superconducting Thin Films
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作者 ZHANG Yaogang SEII Changqing +4 位作者 fan shoushan CUI Changgeng LI Shanlin LI Jun LIU Mingxiong 《Chinese Physics Letters》 SCIE CAS CSCD 1991年第8期416-419,共4页
High T_(c) superconducting YBCO films have been fabricated by in-situ pulsed laser ablation method.The substrates used were SrTiO_(3)(100)and were heated to 650℃ during deposition.X-ray diffraction results indicate t... High T_(c) superconducting YBCO films have been fabricated by in-situ pulsed laser ablation method.The substrates used were SrTiO_(3)(100)and were heated to 650℃ during deposition.X-ray diffraction results indicate that the as-deposited 6lms are highly oriented with c-axis perpendicular to the film surfaces.The critical currents were measured at 77.5 K under different magnetic fields from 0 up to 7 T by using dc four point method.The zero resistance temperature was 89 K and the highest critical current density was 2.5 × 10^(6) A/cm^(2) at 77.5 K under zero field. 展开更多
关键词 DEPOSITION METHOD FIELD
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A process study of electron beam nano-lithography and deep etching with an ICP system 被引量:2
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作者 LI QunQing ZHANG LiHui +1 位作者 CHEN Mo fan shoushan 《Science China(Technological Sciences)》 SCIE EI CAS 2009年第6期1665-1671,共7页
A systemic process study on an electron beam nanolithography system operating at 100kV was pre-sent.The exposure conditions were optimized for resist ZEP520A.Grating structures with line/space of 50nm/50nm were obtain... A systemic process study on an electron beam nanolithography system operating at 100kV was pre-sent.The exposure conditions were optimized for resist ZEP520A.Grating structures with line/space of 50nm/50nm were obtained in a reasonably thick resist which is beneficial to the subsequent pattern transfer technique.The ICP etching process conditions was optimized.The role of etching parameters such as source power,gas pressure,and gas flow rate on the etching result was also discussed.A grating structure with line widths as small as 100nm,duty cycles of 0.5,depth of 900nm,and the side-wall scalloping as small as 5nm on a silicon substrate was obtained.The silicon deep etching technique for structure sizes smaller than 100nm is very important for the fabrication of nano-optical devices working in the visible regime. 展开更多
关键词 ELECTRON BEAM LITHOGRAPHY ZEP520A RESIST REACTIVE ion ETCHING nanofabrication
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Raman spectra of SiC nano-rods with different excitation wavelengths
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作者 YAN Yan HUANG Fumin +3 位作者 ZHANG Shulin ZHU Bangfen SHANG Eryi fan shoushan 《Chinese Science Bulletin》 SCIE EI CAS 2001年第22期1865-1866,共2页
With increasing excitation wavelength from 514 to 782 nm, a significant difference in the Raman spectra of SiC nanorods was observed as compared to bulk material. The intensity ratio of the LO mode to that of the IF m... With increasing excitation wavelength from 514 to 782 nm, a significant difference in the Raman spectra of SiC nanorods was observed as compared to bulk material. The intensity ratio of the LO mode to that of the IF mode increases with the excitation wavelength increasing. This has been identified as resonant Raman scattering caused by Frohlich interaction. 展开更多
关键词 SiC NR Raman spectroscopy Frohlich interaction
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