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Nonpolar Al_(x)Ga_(1−x)N/Al_(y)Ga_(1−y)N multiple quantum wells on GaN nanowire for UV emission
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作者 Sonachand Adhikari Olivier Lee Cheong Lem +5 位作者 felipe kremer Kaushal Vora Frank Brink Mykhaylo Lysevych Hark Hoe Tan Chennupati Jagadish 《Nano Research》 SCIE EI CSCD 2022年第8期7670-7680,共11页
Nonpolar m-plane AlGaN offers the advantage of polarization-free multiple quantum wells(MQWs)for ultraviolet(UV)emission and can be achieved on the sidewalls of selective area grown GaN nanowires.We reveal that the gr... Nonpolar m-plane AlGaN offers the advantage of polarization-free multiple quantum wells(MQWs)for ultraviolet(UV)emission and can be achieved on the sidewalls of selective area grown GaN nanowires.We reveal that the growth of AlGaN on GaN nanowires by metal organic chemical vapor deposition(MOCVD)is driven by vapor-phase diffusion,and consequently puts a limit on the pitch of nanowire array due to shadowing effect.An insight into the difficulty of achieving metal-polar AlGaN nanowire by selective area growth(SAG)in MOCVD is also provided and can be attributed to the strong tendency to form pyramidal structure due to a very small growth rate of{1011}semipolar planes compared to(0001)c-plane.The nonpolar m-plane sidewalls of GaN nanowires obtained via SAG provides an excellent platform for growth of nonpolar AlGaN MQWs.UV emission from mplane Al_(x)Ga_(1−x)N/Al_(y)Ga_(1−y)N MQWs grown on sidewalls of dislocation-free GaN nanowire is demonstrated in the wavelength range of 318–343 nm. 展开更多
关键词 metal organic chemical vapor deposition(MOCVD) NANOWIRE nonpolar plane AlGaN selective area growth multiple quantum wells
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