Random copolymers of methyl methacrylate and fluorinated polyhedral oligomeric silsesquioxane(F-POSS) were synthesized and the corresponding thin films were prepared from solvent casting.Their microstructure was confi...Random copolymers of methyl methacrylate and fluorinated polyhedral oligomeric silsesquioxane(F-POSS) were synthesized and the corresponding thin films were prepared from solvent casting.Their microstructure was confirmed by 1H NMR,elemental analysis and GPC.Separation occurs in the bulk of the film during solvent evaporation which can be evidenced by Transmission Electron Microscopy,TEM,with POSS-rich nanophase sizes from 20 to 50 nm.Nanostructuration is attributed to the self-assembly of F-POSS due to the cluster-cluster interactions resulting from the nature of their ligands,i.e.,cycloaliphatic ligands and perfluorinated chains.Thermogravimetric analysis was used to investigate the thermal degradation temperature.It was shown that when F-POSS content is higher than 2.8 mol%,the incorporation of F-POSS could improve the thermal stability of PMMA significantly.In addition,it was shown that these fluorinated POSS-based copolymer surfaces could reduce the surface energy and could be used to design water-repellant nanocomposite coatings.展开更多
基金supported by the European Community through RTN funded under the 5th frame work programm (HPRN-CT-2002-00306, NBB-HYBRIDS)National Natural Science Foundation of China (50873082)+1 种基金Research Fund for the Doctoral Program of Higher Education (20070384047)Scientific and Technological Innovation Flat of Fujian Province (2009J1009, 2010J01306)
文摘Random copolymers of methyl methacrylate and fluorinated polyhedral oligomeric silsesquioxane(F-POSS) were synthesized and the corresponding thin films were prepared from solvent casting.Their microstructure was confirmed by 1H NMR,elemental analysis and GPC.Separation occurs in the bulk of the film during solvent evaporation which can be evidenced by Transmission Electron Microscopy,TEM,with POSS-rich nanophase sizes from 20 to 50 nm.Nanostructuration is attributed to the self-assembly of F-POSS due to the cluster-cluster interactions resulting from the nature of their ligands,i.e.,cycloaliphatic ligands and perfluorinated chains.Thermogravimetric analysis was used to investigate the thermal degradation temperature.It was shown that when F-POSS content is higher than 2.8 mol%,the incorporation of F-POSS could improve the thermal stability of PMMA significantly.In addition,it was shown that these fluorinated POSS-based copolymer surfaces could reduce the surface energy and could be used to design water-repellant nanocomposite coatings.
