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Hard X-ray focusing resolution and efficiency test with a thickness correction multilayer Laue lens 被引量:1
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作者 Shuai-Peng Yue Liang Zhou +7 位作者 Yi-Ming Yang Hong Shi Bin Ji Ming Li Peng Liu Ru-Yu Yan Jing-Tao Zhu guang-cai chang 《Nuclear Science and Techniques》 SCIE EI CAS CSCD 2022年第9期101-110,共10页
The multilayer Laue lens(MLL) is a diffractive focusing optical element which can focus hard X-rays down to the nanometer scale. In this study, a WSi_(2)/Si multilayer structure consisting of 1736 layers, with a 7.2-n... The multilayer Laue lens(MLL) is a diffractive focusing optical element which can focus hard X-rays down to the nanometer scale. In this study, a WSi_(2)/Si multilayer structure consisting of 1736 layers, with a 7.2-nm-thick outermost layer and a total thickness of 17 μm, is prepared by DC magnetron sputtering. Regarding the thin film growth rate calibration, we correct the long-term growth rate drift from 2 to 0.6%, as measured by the grazing incidence X-ray reflectivity(GIXRR). A one-dimensional line focusing resolution of 64 nm was achieved,while the diffraction efficiency was 38% of the-1 order of the MLL Shanghai Synchrotron Radiation Facility(SSRF) with the BL15U beamline. 展开更多
关键词 Synchrotron radiation Multilayer Laue lens DC magnetron sputtering Grazing incidence X-ray reflectivity Hard X-ray nanofocusing
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