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EFFECTS OF TREATMENT TEMPERATURE ON THE MICROSTRUCTURE AND MAGNETIC PROPERTIES OF Fe-N THIN FILMS 被引量:1
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作者 B.L. Li h.m. du +3 位作者 X.F. Wang E.Y. Jiang Z.Q.Li P. Wu 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2007年第4期293-300,共8页
Fe-N thin films were fabricated on both 100Si and NaCl substrates by RF magnetron sputtering under low nitrogen partial pressure. The microstructure and magnetic properties of Fe-N thin films were investigated with th... Fe-N thin films were fabricated on both 100Si and NaCl substrates by RF magnetron sputtering under low nitrogen partial pressure. The microstructure and magnetic properties of Fe-N thin films were investigated with the increase of the substrate temperature (Ts) and the annealing temperature (Ta). It is more difficult for nitrogen atoms to enter the Fe lattice under higher Ts above 150℃. The phase evolution is visible at higher Ta above 200℃. The phase transformation of α''-Fe16N2 occurred at 400℃. The change of crystal size with Ta was clearly visible from bright and dark field images. The clear high-resolution electron microscope (HREM) images of 110α, 111γ', 112α'', and 200α'' phases were observed. The interplanar distances from TEM (transmission electron microscope) and HREM match the calculated values very well. From the results of the vibrating sample magnetometer (VSM), the good magnetic properties of Fe-N films were obtained at 150℃ of Ts and 200℃ of Ta, respectively. 展开更多
关键词 Fe-N thin film magnetic property HREM α''-Fe16N2
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