A novel cationic photosensitive resin(3 DSLR-01) for stereolithography 3 D printing was prepared with 3,4-epoxycyclohexylmethyl-3’,4’-epoxycyclohexane carboxylate(2021 P),1,4-cyclohexanedimethanol glycidyl ether(JX-...A novel cationic photosensitive resin(3 DSLR-01) for stereolithography 3 D printing was prepared with 3,4-epoxycyclohexylmethyl-3’,4’-epoxycyclohexane carboxylate(2021 P),1,4-cyclohexanedimethanol glycidyl ether(JX-026), diglycidyl 4,5-epoxycyclohexane-1,2-dicarboxylate(S-186), polycaprolactone polyol(Polyol-0305), novolac epoxy resin(F-51), bis(3-ethyl-3-oxetanylmethyl) ether(S-221) and a mixture of triarylsulfonium hexafluoroantimonate salts solution(UVI-6976). The properties of the photosensitive resin and its UV-cured films were investigated by some instruments and equipment.The experimental results show that the critical exposure(Ec) of the photosensitive resin is 16.3 mJ/cm^2, the penetration depth(Dp) is 0.14 mm, and the optical property of the photosensitive resin is excellent. Rectangle plates were printed by using a stereolithography apparatus(HRPL-150 A) with the photosensitive resin as the manufacturing material, and the shrinkage rates of the plates were less than 0.60%, which showed that the accuracy of the manufactured plates was very high.展开更多
Bis[2-(3,4-epoxycyclohexyl)ethyl]octamethyltetrasiloxane is also called diepoxycyclohexylethyl octamethyltetrasiloxane. In the present paper, diepoxycyclohexylethyl octamethyltetrasiloxane was synthesized, and the syn...Bis[2-(3,4-epoxycyclohexyl)ethyl]octamethyltetrasiloxane is also called diepoxycyclohexylethyl octamethyltetrasiloxane. In the present paper, diepoxycyclohexylethyl octamethyltetrasiloxane was synthesized, and the synthesized product was characterized by FTIR and 1 HMR. The synthesized product was compounded with some acrylates and an expoxide as well as photoinitiators to obtain a 3D printing stereolithography resin(3DSLR111). The properties of 3DSLR111 and its UV-cured samples were investigated by some instruments and equipments. The experimental results show that the critical exposure(Ec) of 3DSLR111 is 10.1 mJ/cm^2, its penetration depth(Dp) is 0.15 mm, and its viscosity at 30 ℃ is 319 mPa·s. Some samples were printed with 3DSLR111, and their linear shrinkage and warping factor were evaluated. The linear shrinkage and the curl distortion factor are less than 0.80% and 7.30%, respectively, which indicates that the sample printed with 3DSLR111 has high accuracy, and that the synthesized diepoxycyclohexylethyl octamethyltetrasiloxane can be well applied to the preparation of the photosensitive resin for stereolithography 3D printing.展开更多
基金Funded by the National Natural Science Foundation of China(No.51563017)
文摘A novel cationic photosensitive resin(3 DSLR-01) for stereolithography 3 D printing was prepared with 3,4-epoxycyclohexylmethyl-3’,4’-epoxycyclohexane carboxylate(2021 P),1,4-cyclohexanedimethanol glycidyl ether(JX-026), diglycidyl 4,5-epoxycyclohexane-1,2-dicarboxylate(S-186), polycaprolactone polyol(Polyol-0305), novolac epoxy resin(F-51), bis(3-ethyl-3-oxetanylmethyl) ether(S-221) and a mixture of triarylsulfonium hexafluoroantimonate salts solution(UVI-6976). The properties of the photosensitive resin and its UV-cured films were investigated by some instruments and equipment.The experimental results show that the critical exposure(Ec) of the photosensitive resin is 16.3 mJ/cm^2, the penetration depth(Dp) is 0.14 mm, and the optical property of the photosensitive resin is excellent. Rectangle plates were printed by using a stereolithography apparatus(HRPL-150 A) with the photosensitive resin as the manufacturing material, and the shrinkage rates of the plates were less than 0.60%, which showed that the accuracy of the manufactured plates was very high.
基金Funded by the National Natural Science Foundation of China(No.51563017)
文摘Bis[2-(3,4-epoxycyclohexyl)ethyl]octamethyltetrasiloxane is also called diepoxycyclohexylethyl octamethyltetrasiloxane. In the present paper, diepoxycyclohexylethyl octamethyltetrasiloxane was synthesized, and the synthesized product was characterized by FTIR and 1 HMR. The synthesized product was compounded with some acrylates and an expoxide as well as photoinitiators to obtain a 3D printing stereolithography resin(3DSLR111). The properties of 3DSLR111 and its UV-cured samples were investigated by some instruments and equipments. The experimental results show that the critical exposure(Ec) of 3DSLR111 is 10.1 mJ/cm^2, its penetration depth(Dp) is 0.15 mm, and its viscosity at 30 ℃ is 319 mPa·s. Some samples were printed with 3DSLR111, and their linear shrinkage and warping factor were evaluated. The linear shrinkage and the curl distortion factor are less than 0.80% and 7.30%, respectively, which indicates that the sample printed with 3DSLR111 has high accuracy, and that the synthesized diepoxycyclohexylethyl octamethyltetrasiloxane can be well applied to the preparation of the photosensitive resin for stereolithography 3D printing.
