EELS Technique is used to analyze the amorphous silicon-carbon-hydrogen alloy film deposited by RF sputtering method(RS a-Si_(x)C_(1-x):H).It is further verified that a structural change occurs at 1-x≥0.40 in the all...EELS Technique is used to analyze the amorphous silicon-carbon-hydrogen alloy film deposited by RF sputtering method(RS a-Si_(x)C_(1-x):H).It is further verified that a structural change occurs at 1-x≥0.40 in the alloy film.展开更多
基金supported by the Science Fund of the Chinese Academy of Sciences。
文摘EELS Technique is used to analyze the amorphous silicon-carbon-hydrogen alloy film deposited by RF sputtering method(RS a-Si_(x)C_(1-x):H).It is further verified that a structural change occurs at 1-x≥0.40 in the alloy film.
