The nanofriction properties of hexagonal boron nitride(h-BN)are vital for its application as a substrate for graphene devices and solid lubricants in micro-and nano-electromechanical devices.In this work,the nanofrict...The nanofriction properties of hexagonal boron nitride(h-BN)are vital for its application as a substrate for graphene devices and solid lubricants in micro-and nano-electromechanical devices.In this work,the nanofriction characteristics of h-BN on Si/SiO_(2) substrates with a bias voltage are explored using a conductive atomic force microscopy(AFM)tip sliding on the h-BN surface under different substrate bias voltages.The results show that the nanofriction on h-BN increases with an increase in the applied bias difference(V_(t–s))between the conductive tip and the substrate.The nanofriction under negative V_(t–s) is larger than that under positive V_(t–s).The variation in nanofriction is relevant to the electrostatic interaction caused by the charging effect.The electrostatic force between opposite charges localized on the conductive tip and at the SiO2/Si interface increases with an increase in V_(t–s).Owing to the characteristics of p-type silicon,a positive V_(t–s) will first cause depletion of majority carriers,which results in a difference of nanofriction under positive and negative V_(t–s).Our findings provide an approach for manipulating the nanofriction of 2D insulating material surfaces through an applied electric field,and are helpful for designing a substrate for graphene devices.展开更多
基金This work was supported by the National Natural Science Foundation of China(51675097,U1632128,and 51775105)the Natural Science Foundation of Shanghai(17ZR1400700)the Fundamental Research Funds for the Central Universities ad DHU Distinguished Young Professor Program.
文摘The nanofriction properties of hexagonal boron nitride(h-BN)are vital for its application as a substrate for graphene devices and solid lubricants in micro-and nano-electromechanical devices.In this work,the nanofriction characteristics of h-BN on Si/SiO_(2) substrates with a bias voltage are explored using a conductive atomic force microscopy(AFM)tip sliding on the h-BN surface under different substrate bias voltages.The results show that the nanofriction on h-BN increases with an increase in the applied bias difference(V_(t–s))between the conductive tip and the substrate.The nanofriction under negative V_(t–s) is larger than that under positive V_(t–s).The variation in nanofriction is relevant to the electrostatic interaction caused by the charging effect.The electrostatic force between opposite charges localized on the conductive tip and at the SiO2/Si interface increases with an increase in V_(t–s).Owing to the characteristics of p-type silicon,a positive V_(t–s) will first cause depletion of majority carriers,which results in a difference of nanofriction under positive and negative V_(t–s).Our findings provide an approach for manipulating the nanofriction of 2D insulating material surfaces through an applied electric field,and are helpful for designing a substrate for graphene devices.