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Characterization of a microsecond pulsed non-equilibrium atmospheric pressure Ar plasma using laser scattering and optical emission spectroscopy 被引量:2
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作者 贾凤东 吴勇 +7 位作者 敏琦 苏茂根 Keigo TAKEDA Kenji ISHIKAWA hiroki kondo Makoto SEKINE Masaru HORI 钟志萍 《Plasma Science and Technology》 SCIE EI CAS CSCD 2020年第6期120-127,共8页
A non-equilibrium atmospheric pressure argon(Ar)plasma excited by microsecond pulse is studied experimentally by laser scattering and optical emission spectroscopy(OES),and theoretically by collisional-radiative(CR)mo... A non-equilibrium atmospheric pressure argon(Ar)plasma excited by microsecond pulse is studied experimentally by laser scattering and optical emission spectroscopy(OES),and theoretically by collisional-radiative(CR)model.More specifically,the electron temperature and electron density of plasma are obtained directly by the laser Thomson scattering,the gas temperature is measured by laser Raman scattering,the optical emissions of excited Ar states of plasma are measured by OES.The laser scattering results show that the electron temperature is about 1 eV which is similar to that excited by 60 Hz AC power,but the gas temperature is as low as 300 K compared to about 700 K excited by 60 Hz AC power.It is shown that the microsecond pulsed power supply,rather than nanosecond ones,is short enough to reduce the gas temperature of atmospheric pressure plasma to near room temperature.The electron temperature and electron density are also obtained by CR model based on OES,and find that the intensities of the optical emission intensity lines of 727.41,811.73,841.08,842.83,852.44 and 912.86 nm of Ar can be used to characterize the behavior of electron density and electron temperature,it is very useful to quickly estimate the activity of the atmospheric pressure Ar plasma in many applications. 展开更多
关键词 plasma diagnosis laser Thomson scattering atmospheric pressure plasma
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N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence 被引量:1
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作者 Neelakandan MSanthosh Gregor Filipič +7 位作者 Eva Kovacevic Andrea Jagodar Johannes Berndt Thomas Strunskus hiroki kondo Masaru Hori Elena Tatarova UrošCvelbar 《Nano-Micro Letters》 SCIE EI CAS CSCD 2020年第4期92-108,共17页
Incorporating nitrogen(N)atom in graphene is considered a key technique for tuning its electrical properties.However,this is still a great challenge,and it is unclear how to build N-graphene with desired nitrogen conf... Incorporating nitrogen(N)atom in graphene is considered a key technique for tuning its electrical properties.However,this is still a great challenge,and it is unclear how to build N-graphene with desired nitrogen configurations.There is a lack of experimental evidence to explain the influence and mechanism of structural defects for nitrogen incorporation into graphene compared to the derived DFT theories.Herein,this gap is bridged through a systematic study of different nitrogen-containing gaseous plasma post-treatments on graphene nanowalls(CNWs)to produce N-CNWs with incorporated and substituted nitrogen.The structural and morphological analyses describe a remarkable difference in the plasma–surface interaction,nitrogen concentration and nitrogen incorporation mechanism in CNWs by using different nitrogen-containing plasma.Electrical conductivity measurements revealed that the conductivity of the N-graphene is strongly influenced by the position and concentration of C–N bonding configurations.These findings open up a new pathway for the synthesis of N-graphene using plasma post-treatment to control the concentration and configuration of incorporated nitrogen for application-specific properties. 展开更多
关键词 GRAPHENE Graphene nanowalls Plasma post-treatment Nitrogen incorporation Raman spectroscopy Vacancy defects
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