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Deposition and Characterization of Multilayer DLC/BN Films 被引量:2
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作者 honei chin Chavin Jongwannasiri Shuichi Watanabe 《Materials Sciences and Applications》 2017年第10期738-745,共8页
In this article, the results obtained from a study on multilayer diamond-like carbon and boron nitride (DLC/BN) films are reported. The microstructure, atomic concentration, hardness and friction coefficient of the fi... In this article, the results obtained from a study on multilayer diamond-like carbon and boron nitride (DLC/BN) films are reported. The microstructure, atomic concentration, hardness and friction coefficient of the films were characterized using transmission electron microscopy, auger electron microscopy, nano-indentation measurements and ball-on-disk friction testing. The effects of bilayer thickness and substrate bias on film growth were investigated. All multilayer films showed alternate DLC and BN layers, except the 2- and 4-nm bilayer of multilayer DLC/BN films deposited without substrate bias. Although the layers were very thin, each layer was distinguishable. This was confirmed by the use of TEM imaging and AES measurements. The hardness values of all the multilayer films were lower than those measured for the monolayer DLC and BN films. However, the hardness can be altered with a change in the bilayer thickness. Furthermore, in the case of the films deposited with substrate bias, multilayer DLC/BN films showed an improvement in wear resistance compared to monolayer DLC and BN films. Thus, the deposition of multilayer DLC/BN films can be considered to be beneficial in prolonging the service life of the surface. 展开更多
关键词 DLC/BN MULTILAYER RF SPUTTERING
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Tribological Behavior of Binary B-C Films Deposited by Sputtering-PBII Hybrid System
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作者 honei chin Satoshi Yoshida Shuichi Watanabe 《Materials Sciences and Applications》 2018年第9期723-731,共9页
In this article, the authors report on the use of Radio Frequency (RF) Magnetron Sputtering combined with Plasma-Based Ion Implantation (PBII) technique to synthesize the Boron-Carbon (B-C) films. High purity of boron... In this article, the authors report on the use of Radio Frequency (RF) Magnetron Sputtering combined with Plasma-Based Ion Implantation (PBII) technique to synthesize the Boron-Carbon (B-C) films. High purity of boron carbide (99.5%) disk was used as a target with an RF power of 300 W. The mixtures of Argon (Ar)-Methane (CH4) ware used as reactive gas under varying CH4 partial flow pressure at the specified range of 0 - 0.15 Pa and fixed total gas pressure and total gas flow at 0.30 Pa and 30 sccm, respectively. The effect of CH4 flow ratio on the friction coefficient of B-C films was studied. The friction coefficient of the film depended on the concentration of B. When it was 10% or lower, the coefficient decreased to 0.2 or lower. In this concentration range of B, the specific wear rate also decreased to the order of 10-7 mm3/Nm, and excellent wear resistance was displayed. 展开更多
关键词 BINARY Boron-Carbon (B-C) Film SPUTTERING Plasma-Based Ion IMPLANTATION (PBII) Hybrid System Bonding Structure Friction Performance
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