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Direct calculations on the band offsets of large-latticemismatched and heterovalent Si and III-V semiconductors
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作者 Yuying Hu Chen Qiu +2 位作者 Tao Shen Kaike Yang huixiong deng 《Journal of Semiconductors》 EI CAS CSCD 2021年第11期32-38,共7页
Band offset in semiconductors is a fundamental physical quantity that determines the performance of optoelectronic devices.However,the current method of calculating band offset is difficult to apply directly to the la... Band offset in semiconductors is a fundamental physical quantity that determines the performance of optoelectronic devices.However,the current method of calculating band offset is difficult to apply directly to the large-lattice-mismatched and heterovalent semiconductors because of the existing electric field and large strain at the interfaces.Here,we proposed a modified method to calculate band offsets for such systems,in which the core energy level shifts caused by heterovalent effects and lattice mismatch are estimated by interface reconstruction and the insertion of unidirectional strain structures as transitions,respectively.Taking the Si and III-V systems as examples,the results have the same accuracy as what is a widely used method for small-lattice-mismatched systems,and are much closer to the experimental values for the large-lattice-mismatched and heterovalent systems.Furthermore,by systematically studying the heterojunctions of Si and III-V semiconductors along different directions,it is found that the band offsets of Si/InAs and Si/InSb systems in[100],[110]and[111]directions belong to the type I,and could be beneficial for silicon-based luminescence performance.Our study offers a more reliable and direct method for calculating band offsets of large-lattice-mismatched and heterovalent semiconductors,and could provide theoretical support for the design of the high-performance silicon-based light sources. 展开更多
关键词 Si-based luminescence band offset lattice mismatch heterovalent semiconductors
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宽禁带半导体掺杂机制研究进展 被引量:2
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作者 邓惠雄 魏苏淮 李树深 《科学通报》 EI CAS CSCD 北大核心 2023年第14期1753-1761,共9页
随着电子信息技术进入后摩尔时代,人们期望探寻一些新材料、新技术以推进半导体科学技术的发展.作为新一代战略电子材料,宽禁带半导体的技术应用近年来取得了飞速发展.宽禁带半导体的掺杂与缺陷调控是实现其重要应用价值的关键科学基础... 随着电子信息技术进入后摩尔时代,人们期望探寻一些新材料、新技术以推进半导体科学技术的发展.作为新一代战略电子材料,宽禁带半导体的技术应用近年来取得了飞速发展.宽禁带半导体的掺杂与缺陷调控是实现其重要应用价值的关键科学基础.本文主要介绍了我们和合作者近期围绕碳化物、氧化物、氮化物宽禁带半导体中掺杂与缺陷机理及性能调控展开的研究工作,具体包括:(1)探究4H-SiC中本征缺陷的电学和动力学性质,解释了实验上4H-SiC的有效氢钝化现象的内在物理机制;(2)研究In_(2)O_(3)中过渡金属元素的掺杂物理性质,提出了过渡金属掺杂的设计原则,并预测过渡金属Zr、Hf和Ta在In_(2)O_(3)中具有优异的n型特性;(3)采用轻合金化法调控Ga_(2)O_(3)材料的价带顶位置,并通过选取合适的受主杂质(如CuGa),有望使(Bi_(x)Ga_(1–x))_(2)O_(3)合金成为高效的p型掺杂宽禁带半导体;(4)研究Be和Mg在GaN中的缺陷行为,澄清Be掺杂比Mg掺杂具有更深受主能级的物理机制;(5)提出量子工程非平衡掺杂方法来调制AlGaN的价带,实现其高效p型掺杂;(6)探究缺陷掺杂行为随应力变化的普适性规律,并阐述如何通过压力调控在GaN中实现更高性能的p型掺杂.这些工作不仅加深了对宽禁带半导体材料的电子结构及掺杂与缺陷物理特性的理解,也对基于宽禁带半导体材料的器件设计与实际应用起到重要的指导和推进作用. 展开更多
关键词 宽禁带半导体 第一性原理计算 缺陷 掺杂机制 非平衡过程
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The Coulomb interaction in van der Waals heterostructures
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作者 Le Huang MianZeng Zhong +4 位作者 huixiong deng Bo Li ZhongMing Wei JingBo Li SuHuai Wei 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS CSCD 2019年第3期102-107,共6页
The giant Stark effect(GSE) in a set of van der Waals(vdW) heterostructures is studied using first-principles methods. A straightforward model based on quasi-Fermi levels is proposed to describe the influence of an ex... The giant Stark effect(GSE) in a set of van der Waals(vdW) heterostructures is studied using first-principles methods. A straightforward model based on quasi-Fermi levels is proposed to describe the influence of an external perpendicular electric field on both band gap and band edges. Although a general linear GSE is observed, which is induced by the almost linear variation of the band edges of each layer in the heterostructures, when vdW heterostructures is subjected to small electric fields the variation becomes nonlinear. This can be attributed to the band offsets-induced interlayer charge transfer and resulted intraand inter-layer Coulomb interactions. Our work, thus offers new insight into the mechanism of the nonlinear GSE in vdW heterostructures, which is important for the applications of vdW heterostructures on nanoelectronic devices. 展开更多
关键词 VAN der WAALS HETEROSTRUCTURES gaint STARK effect COULOMB interaction CHARGE transfer
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