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Bipolar tri-state resistive switching characteristics in Ti/CeO_x/Pt memory device
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作者 M.Ismail M.W.Abbas +9 位作者 A.M.Rana i.talib E.Ahmed M.Y.Nadeem T.L.Tsai U.Chand N.A.Shah M.Hussain A.Aziz M.T.Bhatti 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第12期333-338,共6页
Highly repeatable multilevel bipolar resistive switching in Ti/Ce Ox/Pt nonvolatile memory device has been demonstrated. X-ray diffraction studies of Ce O2 films reveal the formation of weak polycrystalline structure.... Highly repeatable multilevel bipolar resistive switching in Ti/Ce Ox/Pt nonvolatile memory device has been demonstrated. X-ray diffraction studies of Ce O2 films reveal the formation of weak polycrystalline structure. The observed good memory performance, including stable cycling endurance and long data retention times(〉10^4s) with an acceptable resistance ratio(~10^2), enables the device for its applications in future non-volatile resistive random access memories(RRAMs). Based on the unique distribution characteristics of oxygen vacancies in Ce Ox films, the possible mechanism of multilevel resistive switching in Ce Ox RRAM devices has been discussed. The conduction mechanism in low resistance state is found to be Ohmic due to conductive filamentary paths, while that in the high resistance state was identified as Ohmic for low applied voltages and a space-charge-limited conduction dominated by Schottky emission at high applied voltages. 展开更多
关键词 multilevel resistive switching Schottky emission cerium oxide oxygen vacancy
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