采用SiLENSe(Simulator of light emitters based on nitride semiconductors)软件仿真研究了Al_(x)In_(y)Ga_(1-x-y)N电子阻挡层(EBL)Al组分渐变方式对GaN基激光二极管(LD)光电性能的影响,实现了提高输出功率和电光转换效率的目的。文...采用SiLENSe(Simulator of light emitters based on nitride semiconductors)软件仿真研究了Al_(x)In_(y)Ga_(1-x-y)N电子阻挡层(EBL)Al组分渐变方式对GaN基激光二极管(LD)光电性能的影响,实现了提高输出功率和电光转换效率的目的。文中提出的四种Al组分渐变方式分别是传统均匀组分、右阶梯渐变组分(0~0.07~0.16)、三角形渐变组分(0~0.16~0)、左阶梯渐变组分(0.16~0.07~0)。结果表明,与传统均匀组分EBL结构相比,Al组分阶梯渐变Al_(x)In_(y)Ga_(1-x-y)N EBL LD导带底的电子势垒显著提高,价带顶的空穴势垒降低。这主要是由于该结构能有效抑制电子泄漏和提高空穴注入效率,从而提高有源区载流子浓度,进而提高有源区辐射复合效率。当注入电流为0.48 A时,采用Al组分阶梯渐变Al_(x)In_(y)Ga_(1-x-y)N EBL结构能将器件开启电压从5.1 V降至4.9 V,光学损耗从3.4 cm^(-1)降至3.29 cm^(-1),从而使光输出功率从335 mW提高至352 mW,电光转换效率从12.5%提高至13.4%。此外,讨论了Al组分阶梯渐变EBL结构对GaN基蓝光LD光电性能的影响机制。该结构设计将为外延生长高功率GaN基LD提供实验数据和理论支撑。展开更多
To explain different doping effects in a buffer layer,thermally annealed interface,and upper epilayers of GaAs/Si films grown by Metalorganic Chemical Vapor Deposition(MOCVD),the behaviors of unintentional doping in G...To explain different doping effects in a buffer layer,thermally annealed interface,and upper epilayers of GaAs/Si films grown by Metalorganic Chemical Vapor Deposition(MOCVD),the behaviors of unintentional doping in GaAs/Si films are investigated in detail.A third doping mechanism of arsine impurity incorporation during the growth process of GaAs/Si films,apart from conventional mechanisms of gas phase reaction and diffusion from the silicon substrate,is proposed.The experimental results reveal that the doping behavior in the buffer layer studied is determined by the three types of doping mechanisms together.However in the thermally annealed interface and upper epilayers,the third doping mechanism is dominant.According to the third mechanism,the background carrier concentration in GaAs/Si films grown by MOCVD could be properly controlled through the arsine flow rate.展开更多
There is nonradiative recombination in waveguide region owing to severe carrier leakage,which in turn reduces output power and wall-plug efficiency.In this paper,we designed a novel epitaxial structure,which suppresse...There is nonradiative recombination in waveguide region owing to severe carrier leakage,which in turn reduces output power and wall-plug efficiency.In this paper,we designed a novel epitaxial structure,which suppresses carrier leakage by inserting n-Ga_(0.55)In_(0.45)P and p-GaAs_(0.6)P_(0.4) between barriers and waveguide layers,respectively,to modulate the energy band structure and to increase the height of barrier.The results show that the leakage current density reduces by 87.71%,compared to traditional structure.The nonradiative recombination current density of novel structure reduces to 37.411 A/cm^(2),and the output power reaches 12.80 W with wall-plug efficiency of 78.24%at an injection current density 5 A/cm^(2) at room temperature.In addition,the temperature drift coefficient of center wavelength is 0.206 nm/℃at the temperature range from 5℃to 65℃,and the slope of fitted straight line of threshold current with temperature variation is 0.00113.The novel epitaxial structure provides a theoretical basis for achieving high-power laser diode.展开更多
基金Supported by the Fundamental Research Funds for the Central University under Grant No 2013RC1205the National Basic Research Program of China under Grant No 2010CB327602。
文摘To explain different doping effects in a buffer layer,thermally annealed interface,and upper epilayers of GaAs/Si films grown by Metalorganic Chemical Vapor Deposition(MOCVD),the behaviors of unintentional doping in GaAs/Si films are investigated in detail.A third doping mechanism of arsine impurity incorporation during the growth process of GaAs/Si films,apart from conventional mechanisms of gas phase reaction and diffusion from the silicon substrate,is proposed.The experimental results reveal that the doping behavior in the buffer layer studied is determined by the three types of doping mechanisms together.However in the thermally annealed interface and upper epilayers,the third doping mechanism is dominant.According to the third mechanism,the background carrier concentration in GaAs/Si films grown by MOCVD could be properly controlled through the arsine flow rate.
文摘There is nonradiative recombination in waveguide region owing to severe carrier leakage,which in turn reduces output power and wall-plug efficiency.In this paper,we designed a novel epitaxial structure,which suppresses carrier leakage by inserting n-Ga_(0.55)In_(0.45)P and p-GaAs_(0.6)P_(0.4) between barriers and waveguide layers,respectively,to modulate the energy band structure and to increase the height of barrier.The results show that the leakage current density reduces by 87.71%,compared to traditional structure.The nonradiative recombination current density of novel structure reduces to 37.411 A/cm^(2),and the output power reaches 12.80 W with wall-plug efficiency of 78.24%at an injection current density 5 A/cm^(2) at room temperature.In addition,the temperature drift coefficient of center wavelength is 0.206 nm/℃at the temperature range from 5℃to 65℃,and the slope of fitted straight line of threshold current with temperature variation is 0.00113.The novel epitaxial structure provides a theoretical basis for achieving high-power laser diode.
