Effects of initial surface termination on electrical characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition are studied by conductive atomic force microscopy working in contact mode and stan...Effects of initial surface termination on electrical characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition are studied by conductive atomic force microscopy working in contact mode and standard electrical characterization methods.It is found that,compared with La2O3/Al2O3 nanolaminates with LaOx as termination,lower interface trap density,less current leakage spots,and higher breakdown voltage are obtained in the La2O3/Al2O3 nanolaminates with AlOx as termination after annealing.A clear promotion of interface silicate layer is observed for La2O3/Al2O3 nanolaminates with AlOx as termination compared with LaOx as termination under the same annealing condition.In addition,the current conduction mechanism in La2O3/Al2O3 nanolaminates is considered as the Poole-Frenkel conduction.All results indicate that the AlOx is a more appropriate termination to deposit La2O3/Al2O3 nanolaminates on Si substrate,which is useful for the high-κ process development.展开更多
基金Project supported by the National Natural Science Foundation of China(Grant Nos.61604016 and 51802025)China Postdoctoral Science Foundation(Grant No.2017M613028)+1 种基金the Fundamental Research Funds for the Central Universities,China(Grant Nos.300102319209 and 300102310501)the Innovation,and Entrepreneurship Training Program for Undergraduates(Grant Nos.202010710231 and 201910710564).
文摘Effects of initial surface termination on electrical characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition are studied by conductive atomic force microscopy working in contact mode and standard electrical characterization methods.It is found that,compared with La2O3/Al2O3 nanolaminates with LaOx as termination,lower interface trap density,less current leakage spots,and higher breakdown voltage are obtained in the La2O3/Al2O3 nanolaminates with AlOx as termination after annealing.A clear promotion of interface silicate layer is observed for La2O3/Al2O3 nanolaminates with AlOx as termination compared with LaOx as termination under the same annealing condition.In addition,the current conduction mechanism in La2O3/Al2O3 nanolaminates is considered as the Poole-Frenkel conduction.All results indicate that the AlOx is a more appropriate termination to deposit La2O3/Al2O3 nanolaminates on Si substrate,which is useful for the high-κ process development.
