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Enhanced compactness and element distribution uniformity of Cu2ZnSnS4 thin film by increasing precursor S content
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作者 Hao Han ji-ning wang +2 位作者 Jing Mi Xiao-Peng Liu Li-Jun Jiang 《Rare Metals》 SCIE EI CAS CSCD 2020年第3期256-261,共6页
Cu2ZnSnS4 thin films were prepared by cosputtering with Cu(or Cu2S),ZnS and SnS2 targets in this study.S amount in the precursor of Cu2ZnSnS4 thin film was verified by using Cu or Cu2S target.The effect of S amount in... Cu2ZnSnS4 thin films were prepared by cosputtering with Cu(or Cu2S),ZnS and SnS2 targets in this study.S amount in the precursor of Cu2ZnSnS4 thin film was verified by using Cu or Cu2S target.The effect of S amount in the precursor on the microstructure and element distribution of Cu2ZnSnS4 thin film was discussed.It was found that S content is sufficient in the precursor thin film using Cu2 S instead of Cu target.The microstructure,composition homogeneity,and secondary phase formation of the Cu2ZnSnS4 thin film are seriously affected by S amount in the precursor thin film.Namely,sufficient S can improve the crystallization and orientation of the precursor thin film and enhance the compactness as well as composition homogeneity of the Cu2ZnSnS4 thin film after sulfurization.Moreover,the secondary phase formation in Cu2ZnSnS4 thin film can be greatly inhibited by increasing S content in the precursor thin film. 展开更多
关键词 Cu2ZnSnS4 Thin film S CONTENT Diffusion
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