Introduction Non-evaporable getter is now widely employed in many accelerators to mitigate the resistive-wall effect of the Ti-Zr-V getter coated vacuum chambers in the next generation accelerators.Methods and discuss...Introduction Non-evaporable getter is now widely employed in many accelerators to mitigate the resistive-wall effect of the Ti-Zr-V getter coated vacuum chambers in the next generation accelerators.Methods and discussions Quaternary Ti-Zr-V-Cu getter films were deposited by direct current(DC)magnetron sputtering.The DC/high frequency impedance and activation kinetics were investigated by four-probes/waveguide methods and in situ synchrotron radiation photoelectron spectroscopy(SRPES).Conclusions Compared to Ti-Zr-V films,Ti-Zr-V-Cu films showed better conductivity,which is beneficial to eliminate the resistive-wall effect.However,its initial activation temperature is above 200℃,and it needs to be activated at a higher temperature to achieve the required pumping performance.展开更多
基金supported by High Energy Photon Source(HEPS),a major national science and technology infrastructure,and Xie Jialin Research Fund(No.E2546HU210)National Development and Reform Commission(2017)No.2173。
文摘Introduction Non-evaporable getter is now widely employed in many accelerators to mitigate the resistive-wall effect of the Ti-Zr-V getter coated vacuum chambers in the next generation accelerators.Methods and discussions Quaternary Ti-Zr-V-Cu getter films were deposited by direct current(DC)magnetron sputtering.The DC/high frequency impedance and activation kinetics were investigated by four-probes/waveguide methods and in situ synchrotron radiation photoelectron spectroscopy(SRPES).Conclusions Compared to Ti-Zr-V films,Ti-Zr-V-Cu films showed better conductivity,which is beneficial to eliminate the resistive-wall effect.However,its initial activation temperature is above 200℃,and it needs to be activated at a higher temperature to achieve the required pumping performance.
