Because of its high compatibility with conventional microfabrication processing technology, epitaxial graphene (EG) grown on SiC shows exceptional promise for graphene-based electronics. However, to date, a detailed...Because of its high compatibility with conventional microfabrication processing technology, epitaxial graphene (EG) grown on SiC shows exceptional promise for graphene-based electronics. However, to date, a detailed understanding of the transformation from three-layer SiC to monolayer graphene is still lacking. Here, we demonstrate the direct atomic-scale observation of EG growth on a SiC (11^-00) surface at 1,000℃ by in situ transmission electron microscopy in combination with ab initio molecular dynamics (AIMD) simulations. Our detailed analysis of the growth dynamics of monolayer graphene reveals that three SiC (11^-00) layers decompose successively to form one graphene layer. Sublimation of the first layer causes the formation of carbon clusters containing short chains and hexagonal rings, which can be considered as the nuclei for graphene growth. Decomposition of the second layer results in the appearance of new chains connecting to the as-formed clusters and the formation of a network with large pores. Finally, the carbon atoms released from the third layer lead to the disappearance of the chains and large pores in the network, resulting in a whole graphene layer. Our study presents a clear picture of the epitaxial growth of the monolayer graphene from SiC and provides valuable information for future developments in SiC-derived EG technology.展开更多
We report an extensive first-principles investigation of impurity-induced device-to-device variability of spin-polarized quantum tunneling through Fe/MgO/Fe magnetic tunnel junctions (MTJ). In particular, we calcula...We report an extensive first-principles investigation of impurity-induced device-to-device variability of spin-polarized quantum tunneling through Fe/MgO/Fe magnetic tunnel junctions (MTJ). In particular, we calculated the tunnel magnetoresistance ratio (TMR) and the average values and variances of the currents and spin transfer torque (STT) of an interfacially doped Fe/MgO/Fe MTJ. Further, we predicted that N-doped MgO can improve the performance of a doped Fe/MgO/Fe MTJ. Our first- principles calculations of the fluctuations of the on/off currents and STT provide vital information for future predictions of the long-term reliability of production. spintronic devices, which is imperative for high-volume展开更多
To fully understand the kinetics of graphene growth,large-scale atomic simulations of graphene islands evolution up to macro sizes(i.e.,graphene islands of a few micrometers or with billions of carbon atoms)during gro...To fully understand the kinetics of graphene growth,large-scale atomic simulations of graphene islands evolution up to macro sizes(i.e.,graphene islands of a few micrometers or with billions of carbon atoms)during growth and etching is essential,but remains a great challenge.In this paper,we developed a low computational cost large-scale kinetic Monte Carlo(KMC)algorithm,which includes all possible events of carbon attachments and detachments on various edge sites of graphene islands.Such a method allows us to simulate the evolution of graphene islands with sizes up to tens of micrometers during either growth or etching with a single CPU core.With this approach and the carefully fitted parameters,we have reproduced the experimentally observed evolution of graphene islands during both growth or etching on Pt(111)surface,and revealed more atomic details of graphene growth and etching.Based on the atomic simulations,we discovered a complementary relationship of graphene growth and etching—the route of graphene island shape evolution during growth is exactly the same as that of the etching of a hole in graphene and that of graphene island etching is exactly same as that of hole growth.The complementary relation brings us a basic principle to understand the growth and etching of graphene,and other 2D materials from atomic scale to macro size and the KMC algorithm is expected to be further developed into a standard simulation package for investigating the growth mechanism of 2D materials on various substrates.展开更多
基金This work was supported by the National Natural Science Foundation of China (Nos. 51420105003, 11525415, 11327901, 61274114, 11674052, and 11604047) and the Fundamental Research Funds for the Central Universities (Nos. 2242016K41039, MTEC-2015M03, and NJ20150026) and the Natural Science Foundation of Jiangsu Province (No. BK20160694). W. Z. and F. D. acknowledge the support of Institute for Basic Science, Republic of Korea (No. IBS-R019-D1). X. W. would like to acknowledge support from the Projects of Science and Technology Commission of Shanghai Municipality (No. 14DZ2260800).
文摘Because of its high compatibility with conventional microfabrication processing technology, epitaxial graphene (EG) grown on SiC shows exceptional promise for graphene-based electronics. However, to date, a detailed understanding of the transformation from three-layer SiC to monolayer graphene is still lacking. Here, we demonstrate the direct atomic-scale observation of EG growth on a SiC (11^-00) surface at 1,000℃ by in situ transmission electron microscopy in combination with ab initio molecular dynamics (AIMD) simulations. Our detailed analysis of the growth dynamics of monolayer graphene reveals that three SiC (11^-00) layers decompose successively to form one graphene layer. Sublimation of the first layer causes the formation of carbon clusters containing short chains and hexagonal rings, which can be considered as the nuclei for graphene growth. Decomposition of the second layer results in the appearance of new chains connecting to the as-formed clusters and the formation of a network with large pores. Finally, the carbon atoms released from the third layer lead to the disappearance of the chains and large pores in the network, resulting in a whole graphene layer. Our study presents a clear picture of the epitaxial growth of the monolayer graphene from SiC and provides valuable information for future developments in SiC-derived EG technology.
文摘We report an extensive first-principles investigation of impurity-induced device-to-device variability of spin-polarized quantum tunneling through Fe/MgO/Fe magnetic tunnel junctions (MTJ). In particular, we calculated the tunnel magnetoresistance ratio (TMR) and the average values and variances of the currents and spin transfer torque (STT) of an interfacially doped Fe/MgO/Fe MTJ. Further, we predicted that N-doped MgO can improve the performance of a doped Fe/MgO/Fe MTJ. Our first- principles calculations of the fluctuations of the on/off currents and STT provide vital information for future predictions of the long-term reliability of production. spintronic devices, which is imperative for high-volume
基金X.K.and F.D.acknowledges support from the Institute for Basic Science(IBS-R019-D1)of South Korea and the computational resources from CMCM,IBS.L.Z.is supported by support from NSFC(Grant No.11704141)Natural Science Foundation of the Jiangsu Higher Education Institutions of China(Grant No.18KJA140001)。
文摘To fully understand the kinetics of graphene growth,large-scale atomic simulations of graphene islands evolution up to macro sizes(i.e.,graphene islands of a few micrometers or with billions of carbon atoms)during growth and etching is essential,but remains a great challenge.In this paper,we developed a low computational cost large-scale kinetic Monte Carlo(KMC)algorithm,which includes all possible events of carbon attachments and detachments on various edge sites of graphene islands.Such a method allows us to simulate the evolution of graphene islands with sizes up to tens of micrometers during either growth or etching with a single CPU core.With this approach and the carefully fitted parameters,we have reproduced the experimentally observed evolution of graphene islands during both growth or etching on Pt(111)surface,and revealed more atomic details of graphene growth and etching.Based on the atomic simulations,we discovered a complementary relationship of graphene growth and etching—the route of graphene island shape evolution during growth is exactly the same as that of the etching of a hole in graphene and that of graphene island etching is exactly same as that of hole growth.The complementary relation brings us a basic principle to understand the growth and etching of graphene,and other 2D materials from atomic scale to macro size and the KMC algorithm is expected to be further developed into a standard simulation package for investigating the growth mechanism of 2D materials on various substrates.
基金This work was supported by the National Basic Research Program of China (No.2013CBA01603),the National Natural Science Foundation of China (No.61335006),and Chinese Academy of Sciences (Nos.1731300500015 and XDB07030100).