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Influence of deep defects on electrical properties of Ni/4H-SiC Schottky diode
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作者 jin-lan li Yun li +4 位作者 ling Wang Yue Xu Feng Yan Ping Han Xiao-li Ji 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第2期400-405,共6页
In this paper, we investigate the influence of deep level defects on the electrical properties of Ni/4H-SiC Schottky diodes by analyzing device current-voltage(I-V) characteristics and deep-level transient spectra(DLT... In this paper, we investigate the influence of deep level defects on the electrical properties of Ni/4H-SiC Schottky diodes by analyzing device current-voltage(I-V) characteristics and deep-level transient spectra(DLTS). Two Schottky barrier heights(SBHs) with different temperature dependences are found in Ni/4 H-SiC Schottky diode above room temperature. DLTS measurements further reveal that two kinds of defects Z_(1/2) and Ti(c)~a are located near the interface between Ni and SiC with the energy levels of E_C-0.67 eV and E_C-0.16 eV respectively. The latter one as the ionized titanium acceptor residing at cubic Si lattice site is thought to be responsible for the low SBH in the localized region of the diode, and therefore inducing the high reverse leakage current of the diode. The experimental results indicate that the Ti(c)~a defect has a strong influence on the electrical and thermal properties of the 4 H-SiC Schottky diode. 展开更多
关键词 4H–SiC SCHOTTKY diodes SCHOTTKY barrier HEIGHTS DEEP DEFECTS DLTS
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