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锆合金初始氧化行为的原位近常压XPS研究 被引量:3
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作者 戴久翔 龚忠苗 +2 位作者 徐诗彤 崔义 姚美意 《物理化学学报》 SCIE CAS CSCD 北大核心 2022年第3期66-73,共8页
锆基合金由于具有低的热中子吸收截面、良好的耐腐蚀性能和力学性能等优点,通常被用于水冷核反应堆中的核燃料包壳和其他结构材料。通过在合金中添加适量的Nb元素可以有效地降低锆合金的氧化速率和吸氢分数,从而改善锆合金的耐腐蚀性能... 锆基合金由于具有低的热中子吸收截面、良好的耐腐蚀性能和力学性能等优点,通常被用于水冷核反应堆中的核燃料包壳和其他结构材料。通过在合金中添加适量的Nb元素可以有效地降低锆合金的氧化速率和吸氢分数,从而改善锆合金的耐腐蚀性能。尽管对锆合金的耐腐蚀性能得到了广泛的认识,但关于其在接近真实氧化腐蚀条件下的原位研究一直是具有挑战性的课题。本工作中利用近常压X射线光电子能谱(NAP-XPS)原位研究了1.3×10^(−8)–1.3×10^(−1)mbar(1 mbar=100 Pa)连续分压下室温到623 K温度时两种锆基合金表面在水,氧中的初始氧化腐蚀行为。结果表明,未添加Nb和添加1%Nb的锆合金表面在初始氧化过程中锆元素都会由金属态向多种氧化态过渡。水蒸气环境下两种合金的氧化速率都要低于氧气环境。室温下无论水蒸气还是氧气环境两种合金的氧化速率都要比623 K高温情况下的慢。在623 K的氧气气氛下,未添加Nb的锆合金相较于添加1%Nb的锆合金更容易被氧化,Nb的添加一定程度上会降低氧物种的吸附能力。在室温下和623 K低水蒸气压力下,1%Nb锆合金氧化速率更快,Nb促进OH−在表面生成。而在623 K高水蒸气压力下,未添加Nb的锆合金有更易于被氧化的倾向,Nb在高温下向表面扩散并抑制OH−键的断裂,但两种样品表面短时间内都无法被完全氧化。 展开更多
关键词 锆合金 NB 初始氧化 原位 近常压X射线光电子能谱
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Exploring the phase transformation in ZnO/Cu(111) model catalysts in CO_(2) hydrogenation
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作者 Rui Wang Hengwei Wang +6 位作者 Xuefei Weng jiuxiang dai Zhongmiao Gong Changbao Zhao Junling Lu Yi Cui Xinhe Bao 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2021年第9期150-155,共6页
Sustainable methanol production via CO_(2) hydrogenation leads to increased interest in the understanding of active phase of Cu/ZnO/Al_(2)O_(3)(CZA) catalyst. Model catalysts of ZnO/Cu(111) with structures varied from... Sustainable methanol production via CO_(2) hydrogenation leads to increased interest in the understanding of active phase of Cu/ZnO/Al_(2)O_(3)(CZA) catalyst. Model catalysts of ZnO/Cu(111) with structures varied from two-dimensional planar to three-dimensional nanoparticles were prepared by atomic layer deposition(ALD) method. By combing scanning tunneling microscopy(STM) and X-ray photoelectron spectroscopy(XPS) at near-ambient pressure of CO_(2) hydrogenation, we reveal that the submonolayer ZnO/Cu(111) transformed into Cu-Zn alloy under 10 mbar CO_(2)/H_(2) at 493 K, and underwent a partial reoxidation during evacuation. The dynamic phase transformation of ZnO/Cu(111) may partly explain the existence of differences and apparently contradictory theories to account for the origin of active phase in CZA catalysts. 展开更多
关键词 ZnO/Cu(111) Methanol synthesis NAP-STM NAP-XPS ALD
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Controlled growth of two-dimensional InAs single crystals via van der Waals epitaxy 被引量:1
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作者 jiuxiang dai Teng Yang +8 位作者 Zhitong Jin Yunlei Zhong Xianyu Hu Jingyi Zou Weigao Xu Tao Li Yuxuan Lin Xu Zhang Lin Zhou 《Nano Research》 SCIE EI CSCD 2022年第11期9954-9959,共6页
Two-dimensional(2D)indium arsenide(InAs)is promising for future electronic and optoelectronic applications such as highperformance nanoscale transistors,flexible and wearable devices,and high-sensitivity broadband pho... Two-dimensional(2D)indium arsenide(InAs)is promising for future electronic and optoelectronic applications such as highperformance nanoscale transistors,flexible and wearable devices,and high-sensitivity broadband photodetectors,and is advantageous for its heterogeneous integration with Si-based electronics.However,the synthesis of 2D InAs single crystals is challenging because of the nonlayered structure.Here we report the van der Waals epitaxy of 2D InAs single crystals,with their thickness down to 4.8 nm,and their lateral sizes up to~37μm.The as-grown InAs flakes have high crystalline quality and are homogenous.The thickness can be tuned by growth time and temperature.Moreover,we explore the thickness-dependent optical properties of InAs flakes.Transports measurement reveals that 2D InAs possesses high conductivity and high carrier mobility.Our work introduces InAs to 2D materials family and paves the way for applying 2D InAs in high-performance electronics and optoelectronics. 展开更多
关键词 two-dimensional materials van der Waals epitaxy indium arsenide nonlayered material
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