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Dielectric Mie voids: confining light in air
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作者 Mario Hentsche Kirll Koshelev +6 位作者 Florian Sterl Steffen Botho julian karst Lida Shamsafar Thomas Weiss Yuri Kivshar Harald Giessen 《Light(Science & Applications)》 SCIE EI CAS CSCD 2023年第2期156-167,共12页
Manipulating light on the nanoscale has become a central challenge in metadevices,resonant surfaces,nanoscale optical sensors,and many more,and it is largely based on resonant light confinement in dispersive and lossy... Manipulating light on the nanoscale has become a central challenge in metadevices,resonant surfaces,nanoscale optical sensors,and many more,and it is largely based on resonant light confinement in dispersive and lossy metals and dielectrics.Here,we experimentally implement a novel strategy for dielectric nanophotonics:Resonant subwavelength localized confinement of light in air.We demonstrate that voids created in high-index dielectric host materials support localized resonant modes with exceptional optical properties.Due to the confinement in air,the modes do not suffer from the loss and dispersion of the dielectric host medium.We experimentally realize these resonant Mie voids by focused ion beam milling into bulk silicon wafers and experimentally demonstrate resonant light confinement down to the UV spectral range at 265 nm(4.68 eV).Furthermore,we utilize the bright,intense,and naturalistic colours for nanoscale colour printing.Mie voids will thus push the operation of functional high-index metasurfaces into the blue and UV spectral range.The combination of resonant dielectric Mie voids with dielectric nanoparticles will more than double the parameter space for the future design of metasurfaces and other micro-and nanoscale optical elements.In particular,this extension will enable novel antenna and structure designs which benefit from the full access to the modal field inside the void as well as the nearly free choice of the high-index material for novel sensing and active manipulation strategies. 展开更多
关键词 DIELECTRIC utilize exceptional
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Photosensitive Material Enabling Direct Fabrication of Filigree 3D Silver Microstructures via Laser-Induced Photoreduction 被引量:2
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作者 Erik Hagen Waller julian karst Georg von Freymann 《Light(Advanced Manufacturing)》 2021年第2期18-23,共6页
Dear Editor Laser-induced photoreduction(LPR)as a direct fabrication technique that promises to be one of the most versatile routes for fabricating highly conductive 3D metallic microstructures on-chip(e.g.,metamateri... Dear Editor Laser-induced photoreduction(LPR)as a direct fabrication technique that promises to be one of the most versatile routes for fabricating highly conductive 3D metallic microstructures on-chip(e.g.,metamaterials,electro-mechanical systems,and high-frequency components like antennas). 展开更多
关键词 SILVER VERSATILE CONDUCTIVE
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