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Fabrication and Characterization of GaN-Based Micro-LEDs on Silicon Substrate 被引量:2
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作者 Qi Wang jun-chi yu +8 位作者 Tao Tao Bin Liu Ting Zhi Xu Cen Zi-Li Xie Xiang-Qian Xiu yu-Gang Zhou You-Dou Zheng Rong Zhang 《Chinese Physics Letters》 SCIE CAS CSCD 2019年第8期94-97,共4页
GaN-based micro light emitting diodes(micro-LEDs) on silicon(Si)substrates with 40μm in diameter are developed utilizing standard photolithography and inductively coupled plasma etching techniques.From currentvoltage... GaN-based micro light emitting diodes(micro-LEDs) on silicon(Si)substrates with 40μm in diameter are developed utilizing standard photolithography and inductively coupled plasma etching techniques.From currentvoltage curves,the relatively low turn-on voltage of 2.8 V and low reverse leakage current in the order of 10-8 A/cm2 indicate good electrical characteristics.As the injection current increases,the electroluminescence emission wavelength hardly shifts at around 433 nm, and the relative external quantum efficiency slightly decays,because the impact of quantum-confined Stark effect is not serious in violet-blue micro-LEDs.Since GaN-LEDs are cost effective on large-area Si and suitable for substrate transfer or vertical device structures,the fabricated micro-LEDs on Si should have promising applications in the fields of high-resolution display and optical communication. 展开更多
关键词 FABRICATION CHARACTERIZATION SILICON
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