Micro or submicron scale light-emitting diodes(μLEDs)have been extensively studied recently as the next-generation display technology.It is desired that μLEDs exhibit high stability and efficiency,submicron pixel si...Micro or submicron scale light-emitting diodes(μLEDs)have been extensively studied recently as the next-generation display technology.It is desired that μLEDs exhibit high stability and efficiency,submicron pixel size,and potential monolithic integration with Si-based complementary metal-oxide-semiconductor(CMOS)electronics.Achieving such uLEDs,however,has remained a daunting challenge.The polar nature of Ill-nitrides causes severe wavelength/color instability with varying carrier concentrations in the active region.The etching-induced surface damages and poor material quality of high indium composition InGaN quantum wells(QWs)severely deteriorate the performance of uLEDs,particularly those emitting in the green/red wavelength.Here we report,for the first time,μLEDs grown directly on Si with submicron lateral dimensions.The μLEDs feature ultra-stable,bright green emission with negligible quantum-confined Stark effect(QCSE).Detailed elemental mapping and numerical calculations show that the QCSE is screened by introducing polarization doping in the active region,which consists of InGaN/AlGaN QWs surrounded by an AlGaN/GaN shell with a negative Al composition gradient along the c-axis.In comparison with conventional GaN barriers,AlGaN barriers are shown to effectively compensate for the tensile strain within the active region,which significantly reduces the strain distribution and results in enhanced indium incorporation without compromising the material quality.This study provides new insights and a viable path for the design,fabrication,and integration of high-performance μLEDs on Si for a broad range of applications in on-chip optical communication and emerging augmented reality/mixed reality devices,and so on.展开更多
基金The work was supported by NS Nanotech Inc.We also acknowledge the financial support of the University of Michigan College of Engineering and NSF grant#DMR-0723032 and technical support from the Lurie Nanofabrication Facility and Michigan Center for Materials Characterization.Y.X.acknowledges support by the National Science Foundation Graduate Research Fellowship under Grant 1841052.
文摘Micro or submicron scale light-emitting diodes(μLEDs)have been extensively studied recently as the next-generation display technology.It is desired that μLEDs exhibit high stability and efficiency,submicron pixel size,and potential monolithic integration with Si-based complementary metal-oxide-semiconductor(CMOS)electronics.Achieving such uLEDs,however,has remained a daunting challenge.The polar nature of Ill-nitrides causes severe wavelength/color instability with varying carrier concentrations in the active region.The etching-induced surface damages and poor material quality of high indium composition InGaN quantum wells(QWs)severely deteriorate the performance of uLEDs,particularly those emitting in the green/red wavelength.Here we report,for the first time,μLEDs grown directly on Si with submicron lateral dimensions.The μLEDs feature ultra-stable,bright green emission with negligible quantum-confined Stark effect(QCSE).Detailed elemental mapping and numerical calculations show that the QCSE is screened by introducing polarization doping in the active region,which consists of InGaN/AlGaN QWs surrounded by an AlGaN/GaN shell with a negative Al composition gradient along the c-axis.In comparison with conventional GaN barriers,AlGaN barriers are shown to effectively compensate for the tensile strain within the active region,which significantly reduces the strain distribution and results in enhanced indium incorporation without compromising the material quality.This study provides new insights and a viable path for the design,fabrication,and integration of high-performance μLEDs on Si for a broad range of applications in on-chip optical communication and emerging augmented reality/mixed reality devices,and so on.
