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Molecular beam epitaxy growth of monolayer hexagonal MnTe_(2)on Si(111)substrate
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作者 S Lu k peng +16 位作者 P D Wang A X Chen W Ren X W Fang Y Wu Z Y Li H F Li F Y Cheng k L Xiong J Y Yang J Z Wang S A Ding Y P Jiang) L Wang Q Li F S Li L F Chi 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第12期142-147,共6页
Monolayer MnTe_(2)stabilized as 1 T structure has been theoretically predicted to be a two-dimensional(2 D)ferromagnetic metal and can be tuned via strain engineering.There is no naturally van der Waals(vdW)layered Mn... Monolayer MnTe_(2)stabilized as 1 T structure has been theoretically predicted to be a two-dimensional(2 D)ferromagnetic metal and can be tuned via strain engineering.There is no naturally van der Waals(vdW)layered MnTe_(2)bulk,leaving mechanical exfoliation impossible to prepare monolayer MnTe_(2).Herein,by means of molecular beam epitaxy(MBE),we successfully prepared monolayer hexagonal MnTe_(2)on Si(111)under Te rich condition.Sharp reflection high-energy electron diffraction(RHEED)and low-energy electron diffraction(LEED)patterns suggest the monolayer is atomically flat without surface reconstruction.The valence state of Mn^(4+)and the atom ratio of([Te]:[Mn])further confirm the MnTe_(2)compound.Scanning tunneling spectroscopy(STS)shows the hexagonal MnTe_(2)monolayer is a semiconductor with a large bandgap of~2.78 eV.The valence-band maximum(VBM)locates at theΓpoint,as illustrated by angle-resolved photoemission spectroscopy(ARPES),below which three hole-type bands with parabolic dispersion can be identified.The successful synthesis of monolayer MnTe_(2)film provides a new platform to investigate the 2D magnetism. 展开更多
关键词 molecular beam epitaxy hexagonal MnTe_(2) band structure
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