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CH_3OD在Si(111)表面上的TDS研究
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作者 王祝盈 k.d.brzoska 《湖南大学学报》 EI CAS CSCD 1991年第2期106-111,共6页
本文运用热脱吸附谱方法(TDS)研究了室温下CH_3OD在Si(Ⅲ)表面上的吸附,对所取得的H_2, HD及D_2的热脱吸附谱进行了分析和比较,并计算出它们的脱吸附能和预指数因子.
关键词 CH3OD SI 吸附 热脱附 TDS 表面
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Adsorption of CH_(3)OD on Si(ll1)Surface at Different Temperatures
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作者 WANG Zhuying HUANG Hongwu +1 位作者 T.Hein k.d.brzoska 《Chinese Physics Letters》 SCIE CAS CSCD 1991年第4期199-202,共4页
Adsorption of deuterated methanol(CH_(3) OD)on Si(111)surface has been studied at different temperatures by means of thermal desorption spectroscopy.For the adsorption temperature below 420℃,the desorption peak of hy... Adsorption of deuterated methanol(CH_(3) OD)on Si(111)surface has been studied at different temperatures by means of thermal desorption spectroscopy.For the adsorption temperature below 420℃,the desorption peak of hydrogen kept up almost unchanged at 510℃(±70℃).But the desorption peak temperature of hydrogen increased obviously for the adsorption temperature above 420℃.We have also found an interesting change in desorption energy of hydrogen. 展开更多
关键词 SPECTROSCOPY ADSORPTION DESORPTION
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