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Atomic layer deposition enabling higher efficiency solar cells:A review 被引量:3
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作者 MdAnower Hossain kean thong khoo +5 位作者 Xin Cui Geedhika K Poduval Tian Zhang Xiang Li Wei Min Li Bram Hoex 《Nano Materials Science》 CAS 2020年第3期204-226,共23页
Atomic layer deposition(ALD)can synthesise materials with atomic-scale precision.The ability to tune the material composition,film thickness with excellent conformality,allow low-temperature processing,and in-situ rea... Atomic layer deposition(ALD)can synthesise materials with atomic-scale precision.The ability to tune the material composition,film thickness with excellent conformality,allow low-temperature processing,and in-situ real-time monitoring makes this technique very appealing for a wide range of applications.In this review,we focus on the application of ALD layers in a wide range of solar cells.We focus on industrial silicon,thin film,organic and quantum dot solar cells.It is shown that the merits of ALD have already been exploited in a wide range of solar cells at the lab scale and that ALD is already applied in high-volume manufacturing of silicon solar cells. 展开更多
关键词 Atomic layer deposition Transition metal oxides Solar cells Contact resistivity Surface passivation Carrier selectivity
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