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Absolute characterization of high numerical aperture microscope objectives utilizing a dipole scatterer 被引量:1
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作者 Jörg S.Eismann Martin Neugebauer +1 位作者 klaus mantel Peter Banzer 《Light(Science & Applications)》 SCIE EI CAS CSCD 2021年第12期2342-2348,共7页
Measuring the aberrations of optical systems is an essential step in the fabrication of high precision optical components.Such a characterization is usually based on comparing the device under investigation with a cal... Measuring the aberrations of optical systems is an essential step in the fabrication of high precision optical components.Such a characterization is usually based on comparing the device under investigation with a calibrated reference object.However,when working at the cutting-edge of technology,it is increasingly difficult to provide an even better or well-known reference device.In this manuscript we present a method for the characterization of high numerical aperture microscope objectives,functioning without the need of calibrated reference optics.The technique constitutes a nanoparticle,acting as a dipole-like scatterer,that is placed in the focal volume of the microscope objective.The light that is scattered by the particle can be measured individually and serves as the reference wave in our system.Utilizing the well-characterized scattered light as nearly perfect reference wave is the main idea behind this manuscript. 展开更多
关键词 CHARACTERIZATION SCATTER SCATTERED
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