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Comparison of tribological properties of industrial low friction coatings 被引量:2
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作者 王吉会 Hua Chen +2 位作者 E.Wieers l.m.stals J.P.Celis 《中国有色金属学会会刊:英文版》 CSCD 2002年第1期78-82,共5页
MX 2 (M=Mo, W; X=S, Se) and DLC (a C: H and WC/C) are the two kinds of typical low friction coatings widely used in industry. The friction and wear properties of these two kinds of coatings marked as MOVIC, MOST, MoSe... MX 2 (M=Mo, W; X=S, Se) and DLC (a C: H and WC/C) are the two kinds of typical low friction coatings widely used in industry. The friction and wear properties of these two kinds of coatings marked as MOVIC, MOST, MoSe 2/Ni, WSe 2, a C: H and WC/C coatings were determined by fretting tests in ambient air of different humidity. The results show that the coefficient of friction of MX 2 coatings increases when the relative humidity of air increases whereas the coefficient of friction DLC coatings decreases with the increasing of relative humidity. MOVIC and WSe 2 coatings have a poor friction and wear resistance because of non basal planes (100) and (101) parallel to the surface in the MOVIC coating, or the rough and porous surface of WSe 2 coatings. Among these six coatings, MoSe 2/Ni and WC/C coatings have the highest wear resistance which seems to be unaffected by the relative humidity. 展开更多
关键词 低摩擦涂层 腐蚀 相对湿度 涂层性能 测试
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Influence of Deposition Conditions on the Crystal Structure of MoS_2 Coating
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作者 Jihui WANG Yang XIA +3 位作者 E. Wieers l.m.stals X.Zhang J.P.Celis 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2006年第3期324-328,共5页
MoS2 coatings were prepared using an unbalanced bipolar pulsed DC (direct current) magnetron sputtering apparatus under different targets, cathode current densities, power modes and bias voltages. The morphology, st... MoS2 coatings were prepared using an unbalanced bipolar pulsed DC (direct current) magnetron sputtering apparatus under different targets, cathode current densities, power modes and bias voltages. The morphology, structure and growth characteristics of MoS2 coatings were observed and identified respectively by scanning electron microscopy, X-ray diffractometry and mass spectrometry. The results show that MoS2 coatings evolve with the (002) basal plane parallel to the surface by using cold pressed target with lower density, lower cathodic current density, bipolar pulse DC power and minus bias voltage, whereas the coatings deposited under hot pressed target, higher cathodic current density, simple DC power and positive bias voltage have the (002) basal plane perpendicular to the surface. The influence of deposition conditions on the crystal structure of MoS2 coating is implemented by altering its growth rate and the energy of sputtering-deposition particles. 展开更多
关键词 Deposition condition Molybdenum disulfide COATING Crystal structure
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Growth characteristics of MoS_2 coatings prepared by unbalanced bipolar DC magnetron sputtering
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作者 王吉会 夏扬 +2 位作者 E.Wieers l.m.stals J.P.Celis 《中国有色金属学会会刊:英文版》 EI CSCD 2005年第6期1214-1218,共5页
MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures and for different deposition times, and the structure and morphology of MoS2 coatings were determined and obser... MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures and for different deposition times, and the structure and morphology of MoS2 coatings were determined and observed respectively by X-ray diffractometry and scanning electron microscopy. The results show that at lower argon pressures of 0.15Pa and 0.40Pa, MoS2 coatings are formed with the (002) basal plane parallel to the surface, whereas the coating deposited at the argon pressure above 0.60Pa has the (002) basal plane perpendicular to the surface. Two stages can be classified for the formation of MoS2 coating. At the initial stage of coating formation, the (002) basal plane with S-Mo-S layer structure grows on the substrate whatever the argon pressure is. And then the coating under 0.40Pa argon pressure still grows with (002) laminate structure, but the coatings under 0.88Pa and 1.60Pa argon pressures turn to grow with the mixed basal and edge orientations. The morphology and structure of MoS2 coatings are highly related to their growth rate and the energy of sputtered particles. 展开更多
关键词 磁控反应溅射 二硫化钼 涂层 生长机制 XRD
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