A new approach to introducing a photoacid generator（PAG） into Langmuir-Blodgett （LB） films to draw photopatterns as a lithographic process is described here. The chemically amplified positive-tone resist system us...A new approach to introducing a photoacid generator（PAG） into Langmuir-Blodgett （LB） films to draw photopatterns as a lithographic process is described here. The chemically amplified positive-tone resist system used here consists of two components ： a copolymer, poly （ dodecrylacrylamide-co-4-t-butyloxylvinyl-phenylcarbonate ） [ P （ DDA-t- BVPC53 ） ] and a PAG, tri （2,3-dibromopropyl） isocyanurate （ TDBPIC ）. In the two-component system, the acid generated by the PAG catalyzes the deprotection reaction of P（ DDA-t-BVPC53）, to remove the tert-butoxycarbonyl group（t-BOC） in the exposed region during the postexposure baking process, thus rendering the exposed region soluble to alkaline aqueous solvents to form a positive tone. Photolithographic properties of the LB films have been evaluated. The patterns can be resolved with a resolution of 1 μm line width by UV irradiation, followed by development with an alkaline solution. The LB films can be used to generate etched gold relief images on a glass substrate via an aqueous iodide, like ammonium iodide, in alcohol/water as the etchant. The etch resistance of such LB films is sufficiently good, allowing patterning of a gold film suitable for photomask fabrication.展开更多
基金Supported by a Grant-in-Aid for Scientific Research from the Japanese Ministry of Education, Sports, and Culture( No.14205130), and Natural Science Foundation of Henan Province(No. 0611020100)
文摘A new approach to introducing a photoacid generator（PAG） into Langmuir-Blodgett （LB） films to draw photopatterns as a lithographic process is described here. The chemically amplified positive-tone resist system used here consists of two components ： a copolymer, poly （ dodecrylacrylamide-co-4-t-butyloxylvinyl-phenylcarbonate ） [ P （ DDA-t- BVPC53 ） ] and a PAG, tri （2,3-dibromopropyl） isocyanurate （ TDBPIC ）. In the two-component system, the acid generated by the PAG catalyzes the deprotection reaction of P（ DDA-t-BVPC53）, to remove the tert-butoxycarbonyl group（t-BOC） in the exposed region during the postexposure baking process, thus rendering the exposed region soluble to alkaline aqueous solvents to form a positive tone. Photolithographic properties of the LB films have been evaluated. The patterns can be resolved with a resolution of 1 μm line width by UV irradiation, followed by development with an alkaline solution. The LB films can be used to generate etched gold relief images on a glass substrate via an aqueous iodide, like ammonium iodide, in alcohol/water as the etchant. The etch resistance of such LB films is sufficiently good, allowing patterning of a gold film suitable for photomask fabrication.
