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安诺素红DS对尼龙56纤维的染色动力学研究 被引量:2
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作者 王亚辉 李辰宇 +5 位作者 梁春光 时奔 安昱飞 袁鑫雅 邢铁玲 卢焦生 《纺织科学与工程学报》 2022年第2期43-47,共5页
为研究活性染料在尼龙56纤维上的染色性能,有效控制其上染过程、预测染色的效果,为优化染色工艺做指导,使用安诺素红DS对尼龙56纤维开展染色动力学研究,采用准一级动力学模型和准二级动力学模型对安诺素红DS上染尼龙56纤维的染色数据进... 为研究活性染料在尼龙56纤维上的染色性能,有效控制其上染过程、预测染色的效果,为优化染色工艺做指导,使用安诺素红DS对尼龙56纤维开展染色动力学研究,采用准一级动力学模型和准二级动力学模型对安诺素红DS上染尼龙56纤维的染色数据进行拟合,计算其染色动力学参数,并探究不同温度及加碱时间对安诺素红DS上染尼龙56纤维的染色动力学影响。结果表明:安诺素红DS对尼龙56纤维的上染过程适合用准二级动力学模型描述,且随着温度的提高平衡吸附量减小,而半染时间则增大;采用两次加碱与一次加碱相比,前者的平衡吸附量较大,上染速率快,半染时间小。 展开更多
关键词 安诺素红DS 尼龙56 染色动力学 加碱时间
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Field Effect Transistor with Self-Organized In_(0.15)Ga_(0.85)As/GaAs Quantum Wires as a Channel Grown on (553)B GaAs Substrates
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作者 LI Xian-Jie YAN Fa-Wang +6 位作者 ZHANG Wen-Jun ZHANG Rong-Gui LIU Wei-Ji AO Jin-Ping ZENG Qing-Ming LIU Shi-Yong liang chun-guang 《Chinese Physics Letters》 SCIE CAS CSCD 2001年第8期1147-1149,共3页
A functional field effect transistor with self-organized In_(0.15)Ga_(0.85)As/GaAs quantum wires(QWRs)as a channel was achieved by molecular beam epitaxy on a(553)B GaAs substrate.Both the three-dimensional image of a... A functional field effect transistor with self-organized In_(0.15)Ga_(0.85)As/GaAs quantum wires(QWRs)as a channel was achieved by molecular beam epitaxy on a(553)B GaAs substrate.Both the three-dimensional image of atom force microscopy and the polarization of the photoluminance peaks reveal that the channel of the device is a self-organized QWR structure.The device with a gate-length of 2μm and a source-drain spacing of 5μm performed a good enhancement-mode characteristic and a maximum transconductance of 65 mS/mm was obtained at the gate voltage of 1.0 V by the geometric gate-width at room temperature.The saturated drain current is as high as 5.6 mA.The device exhibited a much larger current capacity due to the high density of the self-organized QWRs in its channel layer.In addition,the effective gate width was discussed in comparison with the geometric gate width of the device,from which a larger maximum transconductance of 130 mS/mm could be estimated. 展开更多
关键词 DRAIN CHANNEL POLARIZATION
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Enhancement-Mode InAlAs/InGaAs/InP High Electron Mobility Transistor with Strained InAlAs Barrier Layer
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作者 AO Jin-Ping ZENG Qing-Ming +4 位作者 ZHAO Yong-Lin LI Xian-jie LIU Wei-Ji LIU Shi-Yong liang chun-guang 《Chinese Physics Letters》 SCIE CAS CSCD 2000年第8期619-620,共2页
The relatively low Schottky barrier height on In_(0.52)Al_(0.48)As lattice-matched to InP has hampered the achievement of enhancement-mode InA1As/InGaAs/InP high electron mobility transistors(E-HEMTs).By introducing l... The relatively low Schottky barrier height on In_(0.52)Al_(0.48)As lattice-matched to InP has hampered the achievement of enhancement-mode InA1As/InGaAs/InP high electron mobility transistors(E-HEMTs).By introducing lattice mismatched strained aluminum-rich In_(0.45) Al_(0.55)As as the Schottky contact material to enhance the barrier height,we have developed InP-based InAlAs/InGaAs/InP E-HEMT with threshold voltage of about 150 m V.A maximum extrinsic transconductance of 660mS/mm and output conductance of 15mS/mm are measured for 1μm-gate length devices at room temperature.The devices also show excellent radio-frequency performance with cutoff frequency of 50 GHz and maximum oscillation frequency of 54 GHz. 展开更多
关键词 temperature. SCHOTTKY HEMTS
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