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Growth of Free-standing Diamond Films on Graphite Substrates with Ti Interlayers 被引量:2
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作者 lihui-qing licheng-ming chenguang-chao lufan-xiu tangwei-zhong tongyu-mei 《材料热处理学报》 EI CAS CSCD 北大核心 2004年第05B期899-901,共3页
Free-standing diamond films, deposited using DC Arc Plasma Jet CVD method onto graphite substrates with titanium interlayers, have been investigated. The Ti interlayers were deposited by arc ion plating equipments. Th... Free-standing diamond films, deposited using DC Arc Plasma Jet CVD method onto graphite substrates with titanium interlayers, have been investigated. The Ti interlayers were deposited by arc ion plating equipments. The thickness, morphology and composite phase of Ti interlayers were examined by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The titanium carbide (TiC) was detected in both sides of the interlayers, which played an important role with respect to reasonable adhesion with film and diamond nucleation. The semi-translucent diamond films were characterized by SEM and Raman spectrum. The sharp diamond peak with low intensity of amorphous carbon shows that diamond films have very high quality. The overall results suggest that plating Ti interlayer on graphite substrate is an effective way to obtain optical grade free-standing diamond films. 展开更多
关键词 CVD 金刚石薄膜 石墨衬底 钛间界层
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