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Synchrotron Radiation Lithography and MEMS Technique at NSRL 被引量:1
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作者 liu gang, tian yang chao (national synchrotron radiation laboratory, university of science and technology of china, hefei, 230029, china) 《光学精密工程》 EI CAS CSCD 2001年第5期455-457,共3页
Two beamlines and stations for soft X-ray lithography and hard X-ray lithography at NSRL are presented. Synchrotron radiation lithography (SRL) and mask techniques are developed, and the micro-electro-mechanical syste... Two beamlines and stations for soft X-ray lithography and hard X-ray lithography at NSRL are presented. Synchrotron radiation lithography (SRL) and mask techniques are developed, and the micro-electro-mechanical systems (MEMS) techniques are also investigated at NSRL. In this paper, some results based on SRL and MEMS techniques are reported, and sub-micron and high aspect ratio microstructures are given. Some micro-devices, such as microreactors are fabricated at NSRL. 展开更多
关键词 SYNCHROTRON RADIATION LITHOGRAPHY (SRL) MEMS MICROREACTORS
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