原子力显微镜电场辅助纳米沉积加工

主要研究了基于原子力显微镜（AFM）的场蒸发沉积加工方法,分析了影响沉积加工的因素。通过选择适当的针尖和样品间的距离、加工电压和探针运动速度等参数,实现了纳米点、纳米线及纳米字符等纳米结构的加工。纳米点加工中,加工参数保持不变,纳米点的高度变化不大,平均高度约为1.5 nm。纳米线加工中,通过改变加工电压和探针运动速度,加工得到了不同高度的纳米线,其高度最小约为1.5 nm,最高可达65 nm。总体上,沉积加工重复性、可控性较好。然而,沉积加工的起始位置容易产生高度过大的点,并且在纳米线与纳米字符的加工中,加工结果呈现规律性的偏移。分析表明,以上问题主要与探针形貌以及大气环境有关。此外,加工电压过高时也容易导致高度不均匀。

Fabrication and characteristic detection of graphene nanoelectrodes

Graphene has the advantages of high electrical conductivity,high heat conductivity,and low noise,which makes it a potential option for integrated circuits interconnection and nanoelectrodes.In this paper,we present a novel fabrication method for graphene nanoeletrodes with nanogap.First,graphene grown by chemical vapor deposition(CVD)is assembled to a chip with microelectrodes.Second,an atomic force microscopy(AFM)based mechanical cutting method is developed to cut the graphene into nanoribbons and nanoeletrodes with nanogap.Then the electronic property of a single nanodot is characterized using the garphene nanoelectrodes,demonstrating the effectiveness of the graphene nanoelectrodes.The fabricated graphene nanoeletrode pairs can be used as probes to detect single molecule in micro-environment,and show an attractive prospect for future molecular electronics applications.