This research explores Microwave Plasma Chemical Vapor Deposition (MPCVD) for depositing diamond films on steel alloys (316L, 4140, and 1018) with a vanadium carbide interlayer to enhance adhesion and compatibility. T...This research explores Microwave Plasma Chemical Vapor Deposition (MPCVD) for depositing diamond films on steel alloys (316L, 4140, and 1018) with a vanadium carbide interlayer to enhance adhesion and compatibility. The study reveals that a soft vanadium carbide interlayer and the FCC lattice match lead to a Ta-C film. The results of the graphite inhibition and diamond deposition varied with the steel alloy underlayer composition. In the 316L steel alloy, we successfully formed a thick, compressive strain-induced, sp3-bonded tetrahedral amorphous carbon layer without graphite. The findings have wide-ranging applications in environments demanding high durability and thermal conductivity.展开更多
文摘This research explores Microwave Plasma Chemical Vapor Deposition (MPCVD) for depositing diamond films on steel alloys (316L, 4140, and 1018) with a vanadium carbide interlayer to enhance adhesion and compatibility. The study reveals that a soft vanadium carbide interlayer and the FCC lattice match lead to a Ta-C film. The results of the graphite inhibition and diamond deposition varied with the steel alloy underlayer composition. In the 316L steel alloy, we successfully formed a thick, compressive strain-induced, sp3-bonded tetrahedral amorphous carbon layer without graphite. The findings have wide-ranging applications in environments demanding high durability and thermal conductivity.
