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Effects of Stereolithography Process Parameters on the Curing Properties of Si_(3)N_(4)Ceramic Slurries 被引量:1
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作者 lina zhan Yuzhibiao Xia +2 位作者 Xuan zhang Yao Liu Shaojun Liu 《Chinese Journal of Mechanical Engineering(Additive Manufacturing Frontiers)》 2023年第4期65-71,共7页
This paper systematically investigates the effects of process parameters,such as exposure time and slice thickness,on the polymerization kinetics of a Si_(3)N_(4)ceramic slurry.The higher the C=C conversion rate in th... This paper systematically investigates the effects of process parameters,such as exposure time and slice thickness,on the polymerization kinetics of a Si_(3)N_(4)ceramic slurry.The higher the C=C conversion rate in the SLA process,the faster the polymerization rate in the slurry during the initial exposure.However,when the UV exposure time is increased from 5 to 20 s,the solidified gel in the slurry hinders the diffusion of free radicals,causing the C=C conversion rate to stop.The slurry achieves a C=C conversion rate of up to 81%and a curing dimensional accuracy of up to IT7 level at an exposure time of 10 s.When the penetration depth of the slurry is equal to the slice thickness,the difference in C=C conversion rates between the ends of the blank is at least 21%.Furthermore,the Si3 N4 ceramics processed by stereolithography exhibit no defects,such as warpage or holes. 展开更多
关键词 STEREOLITHOGRAPHY Si_(3)N_(4)slurry C=C conversion Curing accuracy
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