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Optical rectification in surface layers of germanium
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作者 Li Zhang Fangye Li +10 位作者 Shuai Wang Qi Wang Kairan Luan Xi Chen Xiuhuan Liu Lingying Qiu Zhanguo Chen Jihong Zhao lixin hou Yanjun Gao Gang Jia 《Chinese Optics Letters》 SCIE EI CAS CSCD 2018年第10期70-73,共4页
In this Letter,we have demonstrated significant electric field induced(EFI)optical rectification(OR)effects existing in the surface layers of germanium(Ge)and measured the distributions of EFI OR signals along the nor... In this Letter,we have demonstrated significant electric field induced(EFI)optical rectification(OR)effects existing in the surface layers of germanium(Ge)and measured the distributions of EFI OR signals along the normal directions of surface layers of Ge samples.Based on the experimental results,the ratios of the twoe-order susceptibility componentsχ^((2effT))_(zzz)∕χ^((2eff))_(zxx)for Ge(001),Ge(110),and Ge(111)surface layers can be estimated to be about 0.92,0.91,and 1.07,respectively.The results indicate that the EFI OR can be used for analyzing the properties on surface layers of Ge,which has potential applications in Ge photonics and optoelectronics. 展开更多
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