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Growth of Niobium Thin Films on Si Substrates by Pulsed Nd:YAG Laser Deposition 被引量:3
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作者 Francisco Gontad Antonella Lorusso +3 位作者 luigi solombrino loannis Koutselas Nikos Vainos Alessio Perrone 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2015年第8期784-789,共6页
The growth of Nb thin films on Si(100) substrates by different laser fluences (4-15 J/cm2) was reported, The pulsed Nd:YAG laser deposition (PLD) under influence of laser fluence on ablation rate and deposition... The growth of Nb thin films on Si(100) substrates by different laser fluences (4-15 J/cm2) was reported, The pulsed Nd:YAG laser deposition (PLD) under influence of laser fluence on ablation rate and deposition rate was discussed. X-ray diffraction (XRD) investigations of the deposited films showed an amorphous structure. The droplet density on the film surface observed by scanning electron microscopy (SEM) analyses was extremely low. It was experimentally proved that the droplets on the film surface originated from liquid phase on the target surface, Profilometric measurements of the deposited Nb films revealed a substantial asymmetry in the film thickness related to the plume deflection effect. The measured electrical resistivity of the Nb film was higher than that of high purity Nb bulk. The present investigations of ablation and deposition process of Nb thin films are related to its potential application in superconducting radio-frequency (SRF) cavities. 展开更多
关键词 Pulsed laser deposition Nb thin films Ablation and deposition rate
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