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Optimization based on sensitivity for material birefringence in projection lens 被引量:2
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作者 Hongbo Shang luwei zhang +3 位作者 Chunlai Liu Ping Wang Yongxin Sui Huaijiang Yang 《Chinese Optics Letters》 SCIE EI CAS CSCD 2020年第6期55-59,共5页
Polarization aberration caused by material birefringence can be partially compensated by lens clocking.In this Letter,we propose a fast and efficient clocking optimization method.First,the material birefringence distr... Polarization aberration caused by material birefringence can be partially compensated by lens clocking.In this Letter,we propose a fast and efficient clocking optimization method.First,the material birefringence distribution is fitted by the orientation Zernike polynomials.On this basis,the birefringence sensitivity matrix of each lens element can be calculated.Then we derive the rotation matrix of the orientation Zernike polynomials and establish a mathematical model for clocking optimization.Finally,an optimization example is given to illustrate the efficiency of the new method.The result shows that the maximum RMS of retardation is reduced by 64%using only 48.99 s. 展开更多
关键词 BIREFRINGENCE polarization aberration projection lens.
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