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Nitrogen Plasma Treatment Effect on Graphene Sheeted Vertically Aligned Carbon Nanofibers
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作者 Dilip Chandra Ghimire m. matsushima m. Umeno 《Journal of Chemistry and Chemical Engineering》 2013年第9期842-846,共5页
Nitrogen plasma treatment effect on GS-CNFs (graphene seeted vertically aligned carbon nanofibers) has been studied. GS-CNFs were grown on nickel coated cupper substrates by DC-plasma CVD (chemical vapor deposition... Nitrogen plasma treatment effect on GS-CNFs (graphene seeted vertically aligned carbon nanofibers) has been studied. GS-CNFs were grown on nickel coated cupper substrates by DC-plasma CVD (chemical vapor deposition) at relatively low temperature. GS-CNFs were studied by SEM (scanning electron microscopy), HR-TEM (high-resolution transmission electron microscopy), XPS and Raman measurements. GS-CNFs are composed of cylindrical shaped having pure graphite sheets with about 5 μm length and nanometer size tips and roots diameter. Nitrogen plasma treatment causes nitrogen chemical etching on the graphene seeted carbon nanofibers were disordered its fine shape and increase the graphetization due to nitrogen incorporation. 展开更多
关键词 DC-plasma CVD graphene seeted carbon nanofibers nitrogen plasma treatment effect.
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