The paper discusses a possible energy transformation that leads to the acceleration of fast ions and electrons.In plasma-focus discharges that occur during deuteriumfilling,which have amaximumcurrent of about 1MA,the ...The paper discusses a possible energy transformation that leads to the acceleration of fast ions and electrons.In plasma-focus discharges that occur during deuteriumfilling,which have amaximumcurrent of about 1MA,the accelerated deuterons produce fast fusion neutrons and fast electrons hard X-ray emissions.Their total energy,which is of the order of several kilojoules,can be delivered by the discharge through a magnetic dynamo and selforganization to the ordered plasma structures that are formed in a pinch during the several hundreds of nanoseconds of the pinch implosion,stagnation,and evolution of instabilities.This energy is finally released during the decay of the ordered plasma structures in the volume between the anode face and the umbrella front of the plasma and current sheath in the form of induced electric fields that accelerate fast electrons and ions.展开更多
The chromium(Cr)films on silicon Si(100)substrate are prepared using DC magnetron sputtering technique at an argon gas pressure of 3 Torr for different applied powers(40—140 W).The chemical composition,the thicknesse...The chromium(Cr)films on silicon Si(100)substrate are prepared using DC magnetron sputtering technique at an argon gas pressure of 3 Torr for different applied powers(40—140 W).The chemical composition,the thicknesses and the structural characterization of the deposited Cr films are studied and analyzed using energy dispersive X-ray spectroscopy(EDX),scanning electron microscopy(SEM),and X-ray diffraction(XRD),respectively.Furthermore,the generated plasma parameters,including floating potential,plasma potential,electron density,ion density and electron temperature,have been measured,and the automated Langmuir probe is used for the Cr films deposition.The ion and metal fluxes are also determined.The results show that the Cr film thickness enhances with the higher applied power.The Cr deposited films properties are characterized and correlated with the measured plasma parameters.展开更多
基金supported in part by research programs funded by Grant Nos.MSMT LTT17015,LTAUSA17084,CZ.02.1.01/0.0/0.0/16_019/0000778,GACR 19-02545S,PPN/BIL/2018/00133/U/00001,IAEA CRP 23071,CRP 23225,and SGS 19/167/OHK3/3T/13by the Polish Ministry of Science and Higher Education using the financial resources allocated in 2019 for international cofinanced projects.
文摘The paper discusses a possible energy transformation that leads to the acceleration of fast ions and electrons.In plasma-focus discharges that occur during deuteriumfilling,which have amaximumcurrent of about 1MA,the accelerated deuterons produce fast fusion neutrons and fast electrons hard X-ray emissions.Their total energy,which is of the order of several kilojoules,can be delivered by the discharge through a magnetic dynamo and selforganization to the ordered plasma structures that are formed in a pinch during the several hundreds of nanoseconds of the pinch implosion,stagnation,and evolution of instabilities.This energy is finally released during the decay of the ordered plasma structures in the volume between the anode face and the umbrella front of the plasma and current sheath in the form of induced electric fields that accelerate fast electrons and ions.
文摘The chromium(Cr)films on silicon Si(100)substrate are prepared using DC magnetron sputtering technique at an argon gas pressure of 3 Torr for different applied powers(40—140 W).The chemical composition,the thicknesses and the structural characterization of the deposited Cr films are studied and analyzed using energy dispersive X-ray spectroscopy(EDX),scanning electron microscopy(SEM),and X-ray diffraction(XRD),respectively.Furthermore,the generated plasma parameters,including floating potential,plasma potential,electron density,ion density and electron temperature,have been measured,and the automated Langmuir probe is used for the Cr films deposition.The ion and metal fluxes are also determined.The results show that the Cr film thickness enhances with the higher applied power.The Cr deposited films properties are characterized and correlated with the measured plasma parameters.