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Enhancement of phosphors-solubility in ZnO by thermal annealing 被引量:1
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作者 K.Mahmood N.Amin +4 位作者 A.Ali M.Ajaz un Nabi m.imran arshad M.Zafar M.Asghar 《Journal of Semiconductors》 EI CAS CSCD 2015年第12期30-33,共4页
We have demonstrated the effect of annealing temperature on the diffusion density of phosphors in zinc oxide. The P-dopant P430 was sprayed on ZnO pellets and annealed at different temperatures from 500 to 1000 ℃ wit... We have demonstrated the effect of annealing temperature on the diffusion density of phosphors in zinc oxide. The P-dopant P430 was sprayed on ZnO pellets and annealed at different temperatures from 500 to 1000 ℃ with a step of 100 ℃ for one hour using a programmable furnace. The concentration of P was controlled by varying the annealing temperature and the maximum solubility of P (3% At) was achieved at annealing 800 ℃ determined by energy dispersive X-ray diffraction (EDX) measurements. X-ray diffraction (XRD) confirmed the hexagonal structure of ZnO and showed that the growth direction was along the c-axis. We observed a maximum up shift in the (002) plane at an annealing temperature of 800 ℃, suggesting that P atoms replaced Zn atoms in the structure which results in the reduction of the lattice constant. Room temperature photoluminescence (PL) spectrum consists of a peak at 3.28 eV and related to band edge emission, but samples annealed at 800 and 900 ℃ have an additional donor acceptor pair peak at 3.2 eV. Hall effect measurements confirmed the p-type conductivity of the sample annealed at 800 ℃. 展开更多
关键词 ZNO P-dopant EDX XRD PL
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