We have fabricated Ni0.81Fe0.19 films with (Ni0.81Fe0.19)1-xCrx films as underlayers by dc magnetron sputtering, the results show that larger anisotropic magnetoresistance (△R/R) values of Ni0.81Fe0.19 films are obse...We have fabricated Ni0.81Fe0.19 films with (Ni0.81Fe0.19)1-xCrx films as underlayers by dc magnetron sputtering, the results show that larger anisotropic magnetoresistance (△R/R) values of Ni0.81Fe0.19 films are observed using the underlayers with Cr concentration of ~36 at.% at an optimum underlayer thickness of ~4.4 nm, the maximum AMR value is 3.35%. The results of atomic force microscope (AFM) and X-ray diffraction (XRD) show that the △R/R enhancement is attributed to the formation of large average grain size and the strong(111) texture in the Ni0.81Fe0.19 films.展开更多
基金This work was supported by the National Natural Science Foundation of China(Grant No.19890310)the Beijing Natural Science Foundation of China(Grant No.201 2011).
文摘We have fabricated Ni0.81Fe0.19 films with (Ni0.81Fe0.19)1-xCrx films as underlayers by dc magnetron sputtering, the results show that larger anisotropic magnetoresistance (△R/R) values of Ni0.81Fe0.19 films are observed using the underlayers with Cr concentration of ~36 at.% at an optimum underlayer thickness of ~4.4 nm, the maximum AMR value is 3.35%. The results of atomic force microscope (AFM) and X-ray diffraction (XRD) show that the △R/R enhancement is attributed to the formation of large average grain size and the strong(111) texture in the Ni0.81Fe0.19 films.