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AZ~ 15nXT Photoresist for Lift-off Applications
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作者 CHEN Chun-wei TOUKHY Medhat +3 位作者 BOGUSZ Zachary meyer stephen LIU Wei-hong LU Ping-hung 《高分子通报》 CAS CSCD 北大核心 2014年第12期170-178,共9页
AZ15nXT is a chemically-amplified negative-tone thick film photoresist.The resist has vertical profile and is widely used for redistribution layer(RDL)and through silicon vias(TSV)applications.For lift-off applicati... AZ15nXT is a chemically-amplified negative-tone thick film photoresist.The resist has vertical profile and is widely used for redistribution layer(RDL)and through silicon vias(TSV)applications.For lift-off applications,however,the inverted profile is needed.In this paper,we report the effects of process conditions on the resist profile and process window for lift off applications. 展开更多
关键词 Chemically amplified THICK film LIFT-OFF NEGATIVE PHOTORESIST INVERTED PROFILE
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